Description

2-[2-(1H,1H,2H,2H-Perfluorooctyl)Isopropoxycarbonyloxyimino]-2-Phenylacetonitrile is a specialized photoacid generator (PAG) monomer designed for advanced photoresist formulations. This compound is critical for enabling high-resolution patterning in the manufacturing of next-generation semiconductors and microelectronic devices. It is primarily utilized by R&D chemists and process engineers in the electronics and photopolymer industries to develop cutting-edge photolithography materials.

Application

• Advanced Photoresist Formulation: A key monomeric component in chemically amplified resists (CARs) for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography.
• Semiconductor Manufacturing: Enables the creation of ultra-fine circuit patterns on silicon wafers for integrated circuits (ICs) and microchips.
• Microelectronics Fabrication: Used in the production of memory chips, processors, and other microelectronic components requiring nanoscale precision.
• Photopolymer Chemistry: Serves as a functional building block in the synthesis of polymers for advanced imaging and patterning applications.
• Research & Development: A valuable reagent for academic and industrial R&D focused on novel photoresist chemistries and lithographic techniques.

Basic Information

Product Name	2-[2-(1H,1H,2H,2H-Perfluorooctyl)Isopropoxycarbonyloxyimino]-2-Phenylacetonitrile
CAS No.	892154-76-6
Molecular Formula	C₂₀H₁₃F₁₇N₂O₃
Molecular Weight	652.31 g/mol
Synonyms	2-[2-(1H,1H,2H,2H-Perfluorooctyl)Isopropoxycarbonyloxyimino]-2-Phenylacetonitrile; 2-Phenyl-2-[(1,1,2,2-tetrahydroperfluorooctyloxycarbonyl)oxyimino]acetonitrile; Photoacid Generator Monomer 892154-76-6; PAG Monomer with Perfluorooctyl Chain; α-(Isobutoxycarbonyloxyimino)-α-phenylacetonitrile perfluorooctyl derivative; Fluorinated Photoinitiator Monomer; EUV PAG Precursor
EINECS	Contact for details

Quality Control

Our production of this high-purity photoacid generator monomer adheres to stringent quality protocols to ensure batch-to-batch consistency and performance reliability for critical lithography applications. Certificates of Analysis (COA) are provided with each shipment, detailing key parameters such as purity, identity, and impurity profiles. We support compliance with relevant industry frameworks for chemical manufacturing and supply chain transparency.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is light-sensitive and should be handled under appropriate conditions to prevent premature decomposition. Keep the container tightly sealed in a dry environment to minimize exposure to moisture.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals	≤ 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.