Description

2-[2-(1H,1H,2H,2H-Perfluorohexyl)Isopropoxycarbonyloxyimino]-2-Phenylacetonitrile is a specialized photoacid generator (PAG) monomer featuring a perfluoroalkyl chain, designed for advanced photoresist formulations. This compound is critical for enabling high-resolution patterning in next-generation semiconductor manufacturing and microelectronics. It is primarily utilized by R&D chemists and process engineers in the photolithography, advanced materials, and electronics industries to develop cutting-edge photoresists for extreme ultraviolet (EUV) and deep ultraviolet (DUV) lithography.

Application

• Advanced Photoresist Formulation: A key monomeric photoacid generator for chemically amplified resists (CARs) used in semiconductor lithography.
• EUV and DUV Lithography: Enables high-resolution patterning for sub-10nm technology nodes in chip fabrication.
• Microelectronics Manufacturing: Used in the production of integrated circuits (ICs), memory chips, and other microelectronic components.
• Photopolymerization Initiator: Serves as a specialized initiator in the synthesis of fluorinated polymers and advanced polymeric materials.
• Surface Modification Agent: Imparts hydrophobic and oleophobic properties to surfaces due to its perfluorohexyl segment.
• Research & Development: A valuable building block for academic and industrial research into novel photoresist chemistries and fluorinated functional materials.

Basic Information

Product Name	2-[2-(1H,1H,2H,2H-Perfluorohexyl)Isopropoxycarbonyloxyimino]-2-Phenylacetonitrile
CAS No.	892154-46-0
Molecular Formula	C20H15F13N2O3
Molecular Weight	602.33 g/mol
Synonyms	2-(2-(Perfluorohexyl)isopropoxycarbonyloxyimino)-2-phenylacetonitrile; (Perfluorohexyl) PAG Monomer; α-(Isobutoxycarbonyloxyimino)-4-(1,1,2,2-tetrahydroperfluorohexyloxy)benzyl cyanide; Photoacid Generator 892154-46-0; Fluorinated Photoinitiator; PAG Monomer with C6F13 chain; 2-Phenyl-2-[(1,1,2,2-tetrahydroperfluorohexyloxy)carbonyloxyimino]acetonitrile
EINECS	Contact for details

Quality Control

Our production of this high-purity photoacid generator adheres to stringent quality protocols to ensure batch-to-batch consistency and performance reliability for critical lithography applications. Each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles. We support customer audits and can provide material to meet the exacting standards required for semiconductor-grade chemicals.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This compound is light-sensitive (store away from light) and may be incompatible with fluoride/strong alkali. Keep the container tightly sealed in a dry environment to prevent moisture uptake.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Heavy Metals	< 10 ppm
Residual Solvents (GC)	Meets ICH guidelines
Water Content (KF)	< 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.