Description

Tf-Hf CAS NO 209861-01-8 is a high-purity organometallic compound containing hafnium, specifically designed for advanced material synthesis. This compound is critical for applications requiring precise metal-organic frameworks and thin-film deposition processes. It serves as a key precursor for researchers and manufacturers in the semiconductor, catalysis, and specialty chemical industries.

Application

• Semiconductor Manufacturing: As a high-purity precursor for Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) of hafnium-based dielectric films.
• Catalysis Research: Used in the development of novel catalysts for polymerization and organic synthesis reactions.
• Advanced Material Synthesis: A crucial building block for creating metal-organic frameworks (MOFs) and coordination polymers with specific electronic properties.
• Thin-Film Coating: Employed in the production of optical and protective coatings on various substrates.
• Chemical Vapor Infiltration (CVI): For the fabrication of ceramic matrix composites and fiber-reinforced materials.
• Laboratory Reagent: Serves as a standardized reagent for analytical chemistry and material science research.

Basic Information

Product Name	Tf-Hf
CAS No.	209861-01-8
Molecular Formula	Contact for details
Molecular Weight	Contact for details
Synonyms	Hafnium Triflate; Hafnium Trifluoromethanesulfonate; Hafnium(III) Triflate; Trifluoromethanesulfonic Acid Hafnium Salt; Tf-Hf Complex; Hf(OTf)3; Hafnium Trifluoromethanesulphonate
EINECS	Contact for details

Quality Control

Our Tf-Hf is produced under stringent quality management protocols to ensure batch-to-batch consistency and high purity. The product undergoes comprehensive analytical testing, including assay and impurity profiling, to meet the exacting standards required for electronic and catalytic applications. A Certificate of Analysis (COA) detailing specific results is provided with each shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). Due to its hygroscopic nature, the container must be kept tightly sealed under an inert atmosphere (e.g., nitrogen or argon) when not in use to prevent moisture absorption and degradation.

Specification

Item	Specification
Appearance	White to off-white solid
Identification (IR)	Conforms to structure
Assay (Hf content)	≥ 99.0%
Purity (HPLC)	≥ 98.5%
Moisture (KF)	≤ 0.5%
Heavy Metals (as Pb)	≤ 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.