Description

3,3,3-Trifluoropropen-1-Yl Phenyl Tolyl Sulfonium Triflate is a specialized photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. This compound matters for its ability to generate strong acids upon exposure to specific light sources, enabling precise patterning in microelectronics manufacturing. It is essential for producers of semiconductor photoresists, advanced packaging materials, and high-resolution display technologies who require exceptional purity and consistent performance for next-generation lithography processes.

Application

• Advanced Semiconductor Lithography: A key photoacid generator (PAG) in chemically amplified resists (CAR) for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes.
• Microelectronics Fabrication: Used in the production of integrated circuits (ICs), memory chips, and processors, enabling finer feature sizes and higher device density.
• Photopolymerization Catalyst: Initiates cationic polymerization in UV-curable coatings, inks, and adhesives for electronics and industrial applications.
• Advanced Packaging: Employed in photoresists for fan-out wafer-level packaging (FOWLP) and through-silicon via (TSV) processes.
• Optical Component Manufacturing: Facilitates the patterning of waveguides, micro-lenses, and other precision optical elements.
• Research & Development: Serves as a critical reagent in academic and industrial R&D for developing new photoresist chemistries and lithographic techniques.

Basic Information

Product Name	3,3,3-Trifluoropropen-1-Yl Phenyl Tolyl Sulfonium Triflate
CAS No.	1228046-58-9
Molecular Formula	C17H14F6O3S2
Molecular Weight	444.41 g/mol
Synonyms	Phenyl(3,3,3-trifluoroprop-1-en-1-yl)(p-tolyl)sulfonium Trifluoromethanesulfonate; (3,3,3-Trifluoro-1-propenyl)(phenyl)(4-methylphenyl)sulfonium Triflate; Sulfonium, (3,3,3-trifluoro-1-propenyl)phenyl-p-tolyl-, trifluoromethanesulfonate; Photoacid Generator PAG; Sulfonium Salt PAG; Trifluoropropenyl Sulfonium Triflate; Phenyl Tolyl Sulfonium Salt
EINECS	Contact for details

Quality Control

Our 3,3,3-Trifluoropropen-1-Yl Phenyl Tolyl Sulfonium Triflate is manufactured under strict quality management systems to ensure it meets the exacting standards of the microelectronics industry. Each batch undergoes comprehensive analytical testing, including HPLC for purity and identity confirmation, to guarantee high batch-to-batch consistency and performance reliability. Certificates of Analysis (COA) with detailed specifications are provided and can be tailored to meet specific customer requirements.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and should be handled under dry, inert conditions to prevent decomposition. Keep the container tightly sealed in a desiccator when not in use.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Chloride (Cl)	≤ 50 ppm
Sulfate (SO4)	≤ 50 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.