Description

2-((1,1,1,3,3,3-Hexafluoropropan-2-Yl)Oxy)-2-Oxoethyl Methacrylate is a specialized fluorinated methacrylate monomer designed for advanced polymer synthesis. This compound matters for its ability to impart unique properties like enhanced chemical resistance, low surface energy, and improved thermal stability to polymeric materials. It is primarily needed by R&D chemists and material scientists in the photoresist, optical coatings, and high-performance fluoropolymer industries seeking to develop next-generation functional materials.

Application

• Photoresist Formulation: A key monomer for 193nm and EUV photoresists used in advanced semiconductor lithography, providing excellent transparency and etch resistance.
• Fluorinated Polymer Synthesis: Serves as a building block for creating specialty fluoropolymers and copolymers with enhanced chemical and thermal stability.
• Optical Coatings & Films: Used to produce low-refractive-index, anti-reflective, and hydrophobic coatings for optical lenses, displays, and sensors.
• Surface Modification: Imparts low surface energy and oil/water repellency (omniphobicity) when grafted onto various substrates.
• Adhesive & Sealant Formulations: Incorporated to improve the environmental resistance and durability of high-performance adhesives.
• Biomedical Materials: Potential use in creating biocompatible, fouling-resistant surfaces for medical devices.

Basic Information

Product Name	2-((1,1,1,3,3,3-Hexafluoropropan-2-Yl)Oxy)-2-Oxoethyl Methacrylate
CAS No.	1176273-30-5
Molecular Formula	C9H8F6O4
Molecular Weight	294.15 g/mol
Synonyms	Hexafluoroisopropyl Methacryloxyacetate; 2-(Methacryloyloxy)acetic Acid 1,1,1,3,3,3-Hexafluoro-2-propyl Ester; HFIP-MAA; 1,1,1,3,3,3-Hexafluoro-2-propyl Methacryloxyacetate; 2-((Hexafluoroisopropoxy)carbonyl)ethyl Methacrylate; Glycolic Acid, Methacrylate, Hexafluoroisopropyl Ester
EINECS	Contact for details

Quality Control

Our 2-((1,1,1,3,3,3-Hexafluoropropan-2-Yl)Oxy)-2-Oxoethyl Methacrylate is manufactured under strict quality protocols to ensure batch-to-batch consistency and high purity suitable for sensitive applications like photoresists. We provide comprehensive Certificates of Analysis (COA) with each shipment, detailing key parameters such as purity, identity, and impurity profiles. Our quality system is designed to meet the stringent requirements of the electronics and specialty chemical industries.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at a recommended temperature of 2-8°C (refrigerated) to maximize shelf life and inhibit premature polymerization. Keep away from heat, sparks, and open flame. For long-term storage under inert atmosphere (e.g., nitrogen or argon), please contact our technical team for specific recommendations.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.1%
Acid Value (Titration)	≤ 1.0 mg KOH/g
Inhibitor (MEHQ)	50 - 200 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.