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1,1-Difluorodisilane CAS NO 15857-41-7
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CAS No.:15857-41-7
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
1,1-Difluorodisilane is a highly reactive and volatile organosilicon compound, serving as a critical precursor in advanced material synthesis. Its value lies in its ability to introduce both silicon and fluorine functionalities in a single step, enabling precise engineering of surface properties and material structures. This compound is essential for researchers and manufacturers in the semiconductor, specialty chemical, and advanced materials industries, particularly for applications requiring high-purity silicon-based thin films and coatings.
Application
- Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD): As a key silicon and fluorine source for depositing silicon carbide (SiC), silicon nitride (SiN), and fluorinated silicon-based thin films on semiconductor wafers.
- Surface Functionalization: For modifying material surfaces to impart specific properties such as hydrophobicity, oleophobicity, or chemical resistance.
- Synthesis of Fluorinated Silanes: Acting as a versatile building block in the production of more complex fluorinated organosilicon compounds and polymers.
- Research & Development: Utilized in academic and industrial R&D for exploring new silicon-fluorine chemistry, novel precursors, and advanced material applications.
- Plasma-Enhanced Processes: Serving as a feedstock gas in plasma processes for creating fluorinated silicon-containing coatings with tailored electronic or mechanical properties.
Basic Information
| Product Name | 1,1-Difluorodisilane |
| CAS No. | 15857-41-7 |
| Molecular Formula | H6F2Si2 |
| Molecular Weight | 96.23 g/mol |
| Synonyms | Difluorodisilane; Disilane, 1,1-difluoro-; 1,1-Difluorodisilane; H3Si-SiFH2; Silicon fluoride hydride (Si2H4F2); Fluorinated disilane |
| EINECS | Contact for details |
Quality Control
Our 1,1-Difluorodisilane is produced and handled under stringent quality management protocols to ensure batch-to-batch consistency and high purity, critical for sensitive applications like semiconductor fabrication. Each lot is analyzed using advanced techniques including Gas Chromatography (GC) and NMR to verify identity and purity. A comprehensive Certificate of Analysis (COA) detailing all specifications is provided with every shipment. We adhere to relevant industry standards and can support customer-specific quality requirements.
Storage
Preserve in a tightly closed container, protected from light. Due to its highly volatile and reactive nature (fluoride/strong alkali), this material must be stored under an inert atmosphere (e.g., argon or nitrogen) in a cool, well-ventilated area, away from heat, ignition sources, and incompatible materials such as strong oxidizers and moisture. Recommended storage temperature is between 2°C and 8°C to minimize volatility and degradation. Containers must be kept sealed and upright.
Specification
| Item | Specification |
|---|---|
| Appearance | Colorless gas / liquid (under pressure) |
| Identification (IR) | Conforms to reference spectrum |
| Purity (GC) | ≥ 98.0% (area %) |
| Moisture (KF) | ≤ 50 ppm |
| Non-condensable gases | ≤ 0.5% (v/v) |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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