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Tris(Dimethylamino)Antimony CAS NO 7289-92-1


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CAS No.:7289-92-1

Grade:Pharmacy Grade

Content:99.9%

Brand:Customizable

Packaging:Customizable

Description

Tris(Dimethylamino)Antimony is a highly reactive organometallic compound primarily used as a precursor in advanced material synthesis. This compound matters for its role in depositing high-purity antimony-containing thin films, which are critical for next-generation semiconductor and optoelectronic devices. Industries that need it include manufacturers of III-V semiconductors, photovoltaic cells, and specialized catalysts, where precise stoichiometry and purity are paramount for performance.

Application

  • Metal-Organic Chemical Vapor Deposition (MOCVD): A key precursor for the deposition of antimonide-based semiconductor layers (e.g., GaSb, InSb) used in infrared detectors, high-speed electronics, and thermophotovoltaics.
  • Atomic Layer Deposition (ALD): Employed in the controlled, layer-by-layer growth of antimony oxide or antimonide films for microelectronics and nano-fabrication.
  • Catalyst Synthesis: Serves as a reagent in the preparation of specialized catalysts for organic transformations, including polymerization and cross-coupling reactions.
  • Dopant Source: Used in the doping of semiconductors to modify electrical properties.
  • Research & Development: A vital starting material in academic and industrial R&D for exploring new antimony-containing materials and compounds.
  • Phosphor and Luminescent Material Production: Involved in the synthesis of materials for LED and display technologies.

Basic Information

Product Name Tris(Dimethylamino)Antimony
CAS No. 7289-92-1
Molecular Formula C6H18N3Sb
Molecular Weight 256.00 g/mol
Synonyms Tris(dimethylamino)stibine; Antimony tris(dimethylamide); Tris(N,N-dimethylamino)antimony; TDMA-Sb; (Dimethylamino)antimony; N,N,N',N',N'',N''-Hexamethylantimonotriamine; Stibine, tris(dimethylamino)-; Antimony(III) dimethylamide
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Quality Control

Our Tris(Dimethylamino)Antimony is produced and handled under stringent quality management systems to ensure batch-to-batch consistency and high purity, essential for sensitive deposition processes. Each lot is analyzed to confirm identity, purity, and impurity profiles. Certificates of Analysis (COA) detailing specific results are available upon request. We support customer audits and can provide material to meet the exacting standards required for semiconductor and electronic grade applications.

Storage

Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (e.g., nitrogen or argon) in a cool, dry, and well-ventilated area. Due to its highly volatile, hygroscopic, and easily oxidized nature, the container must be kept sealed and allowed to reach ambient temperature before opening to minimize moisture ingress and decomposition. Recommended long-term storage temperature is 2-8°C.

Specification

Item Specification
Appearance Colorless to pale yellow liquid
Identification (IR) Conforms
Assay (GC or NMR) ≥ 98.0%
Density (at 20°C) ~1.2 g/mL
Metal Impurities (ICP-MS) ≤ 10 ppm total
Chloride Content ≤ 50 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.

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