Description

Gallium(III) Hydride is a highly reactive inorganic compound of gallium and hydrogen. This material is of significant interest in advanced materials science and semiconductor manufacturing due to its role as a precursor for gallium-containing thin films. It is primarily utilized by research institutions and industrial manufacturers specializing in electronics and nanotechnology. CAS No. 13572-93-5.

Application

• Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD): Serves as a critical gallium source for depositing high-purity gallium nitride (GaN) and other III-V semiconductor films.
• Advanced Materials Synthesis: Used as a precursor in the synthesis of novel gallium-based alloys and nanocomposites for specialized applications.
• Research & Development: Employed in academic and industrial labs for exploring new catalytic processes and hydrogen storage materials.
• Doping Agent: Can be used in the controlled introduction of gallium into silicon and other semiconductor substrates.
• Optoelectronics Fabrication: A key material in the production of light-emitting diodes (LEDs) and laser diodes based on gallium compounds.

Basic Information

Product Name	Gallium(III) Hydride
CAS No.	13572-93-5
Molecular Formula	GaH3
Molecular Weight	72.74 g/mol
Synonyms	Gallane; Trihydridogallium; Gallium trihydride; Gallium hydride (GaH3); Hydrogen gallide; Gallium(III) hydride; Gallium hydride
EINECS	Contact for details

Quality Control

Our Gallium(III) Hydride is produced and handled under stringent conditions to ensure batch-to-batch consistency and high purity. Quality is verified through advanced analytical techniques. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles is provided with each shipment to ensure compliance with your specific research or manufacturing requirements.

Storage

Preserve in a tightly closed container, protected from light. Due to its highly volatile, gaseous, and easily oxidized nature, this material must be stored under an inert atmosphere (e.g., argon or nitrogen) at controlled, cool temperatures. Handle only in a well-ventilated area or glovebox to prevent exposure to air and moisture.

Specification

Item	Specification
Appearance	Colorless gas / volatile solid (under specific conditions)
Identification (IR)	Conforms to structure
Purity (by GC/MS)	≥ 99.9% (Research Grade)
Major Metallic Impurities (ICP-MS)	Al, In, Zn: < 10 ppm each
Oxygen Content	Contact for details

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.