Description

Triisopropylgallium is a highly reactive organometallic compound of gallium, primarily used as a precursor in advanced material synthesis. Its value lies in its ability to deliver high-purity gallium in vapor phase processes, which is critical for achieving precise electronic and optical properties in thin films. This compound is essential for manufacturers and R&D facilities in the semiconductor, photovoltaics, and LED industries seeking reliable, high-performance metalorganic sources for chemical vapor deposition (CVD) and related techniques.

Application

• As a gallium precursor in Metalorganic Chemical Vapor Deposition (MOCVD) for the growth of III-V compound semiconductors like GaAs, GaN, and GaP.
• Key material in the fabrication of high-efficiency light-emitting diodes (LEDs) and laser diodes.
• Used in the production of advanced photovoltaic cells for solar energy applications.
• Essential for depositing gallium-containing layers in microelectronics and optoelectronic devices.
• Employed in research and development of novel nanomaterials and thin-film coatings with specific electronic properties.
• Serves as a catalyst or reagent in specialized organometallic synthesis and organic transformations.

Basic Information

Product Name	Triisopropylgallium
CAS No.	54514-59-9
Molecular Formula	C9H21Ga
Molecular Weight	185.97 g/mol
Synonyms	Gallium triisopropoxide (incorrect but common); Tri-iso-propylgallium; TIPGa; (i-Pr)3Ga; Tris(isopropyl)gallium; Isopropylgallium; Gallium(III) triisopropide; Gallium triisopropyl
EINECS	Contact for details

Quality Control

Our Triisopropylgallium is produced and handled under stringent conditions to ensure the highest purity and consistency required for electronic-grade applications. Each batch is analyzed using advanced techniques such as NMR, GC-MS, and elemental analysis to verify composition and impurity profiles. Certificates of Analysis (COA) detailing lot-specific results are provided to guarantee compliance with your technical specifications and support your quality management systems.

Storage

Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) in a cool, dry, well-ventilated area. Due to its pyrophoric and moisture-sensitive nature, it must be handled exclusively using air-free techniques. Recommended long-term storage temperature is between 2°C and 8°C.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (NMR)	Conforms to structure
Purity (GC)	≥ 99.9% (Electronic Grade)
Gallium (Ga) Content	≥ 37.4%
Volatile Metal Impurities	< 1 ppm each (e.g., Al, Cu, Fe, Mg, Na, Zn)

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.