Description

N,N,N',N'-Tetramethyl-1,3-Bis[Tris(Methylamino)Silyl]Cyclobutanedisilazane-2,2,4,4-Tetraamine is a specialized organosilicon compound featuring a unique cyclobutane disilazane core with multiple methylamino substituents. This complex molecular architecture makes it a valuable precursor and building block in advanced materials science. It is primarily utilized by researchers and manufacturers in the semiconductor and specialty polymer industries for developing novel silicon-based materials, coatings, and surface modifiers.

Application

• Semiconductor Manufacturing: Acts as a high-purity precursor for chemical vapor deposition (CVD) or atomic layer deposition (ALD) processes to deposit silicon nitride (SiN) or silicon carbonitride (SiCN) thin films.
• Advanced Polymer Synthesis: Serves as a cross-linking agent or monomer for synthesizing heat-resistant and high-performance silicon-containing polymers and resins.
• Surface Modification: Used to functionalize silica, glass, or other inorganic surfaces with specific amino-silyl groups to alter surface energy, adhesion, or reactivity.
• Catalyst and Ligand Development: Provides a complex ligand framework for coordination chemistry and the development of novel catalysts in organic synthesis.
• Specialty Additives: Incorporated into formulations to enhance the thermal stability, mechanical properties, or chemical resistance of composite materials.
• Research & Development: A key intermediate for academic and industrial R&D focused on novel organosilicon chemistry and nanotechnology.

Basic Information

Product Name	N,N,N',N'-Tetramethyl-1,3-Bis[Tris(Methylamino)Silyl]Cyclobutanedisilazane-2,2,4,4-Tetraamine
CAS No.	34665-55-9
Molecular Formula	C16H50N10Si4
Molecular Weight	507.0 g/mol
Synonyms	1,3-Bis[tris(methylamino)silyl]-N,N,N',N'-tetramethylcyclobutanedisilazane-2,2,4,4-tetraamine; Cyclobutanedisilazane-2,2,4,4-tetraamine, N,N,N',N'-tetramethyl-1,3-bis[tris(methylamino)silyl]-; Tetramethyl-bis(tris(methylamino)silyl)cyclobutanedisilazane tetraamine; Amino-functional cyclobutane disilazane; Silicon nitride precursor
EINECS	Contact for details

Quality Control

Our production of N,N,N',N'-Tetramethyl-1,3-Bis[Tris(Methylamino)Silyl]Cyclobutanedisilazane-2,2,4,4-Tetraamine adheres to stringent quality protocols to ensure batch-to-batch consistency and high purity, critical for sensitive applications like semiconductor fabrication. Each lot is analyzed using advanced techniques including NMR, FT-IR, and GC-MS for identity confirmation and impurity profiling. Certificates of Analysis (COA) detailing purity, assay, and specific tests are provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). This compound is hygroscopic (moisture-sensitive) and must be handled under a dry, inert atmosphere (argon or nitrogen) to prevent degradation. Keep away from heat, sparks, and open flame.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 95.0%
Purity (GC)	≥ 97.0%
Water Content (KF)	≤ 0.5%
Density (at 20°C)	~0.95 - 1.05 g/mL

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.