Description

Hafnium n-Butoxide is a high-purity metal-organic compound used as a precursor in advanced materials synthesis. This compound is critical for depositing uniform, high-quality hafnium oxide (HfO₂) thin films with precise stoichiometric control. It is essential for manufacturers and R&D facilities in the semiconductor, optical coating, and specialty ceramics industries seeking reliable performance in vapor deposition processes.

Application

• Atomic Layer Deposition (ALD) & Chemical Vapor Deposition (CVD): A key precursor for depositing high-k dielectric hafnium oxide films in semiconductor gate stacks and memory devices.
• Optical Coatings: Used to create thin films with high refractive index for anti-reflective coatings, laser optics, and interference filters.
• Specialty Ceramics & Powders: Serves as a starting material in sol-gel processes for producing high-purity hafnium-based ceramics and nanopowders.
• Catalysis Research: Employed as a catalyst or catalyst precursor in organic synthesis and polymerization reactions.
• Surface Modification: Used to functionalize surfaces with hafnium-containing groups to alter wettability, adhesion, or corrosion resistance.
• Research & Development: A vital reagent in academic and industrial labs for developing new materials, including metal-organic frameworks (MOFs) and hybrid composites.

Basic Information

Product Name	Hafnium n-Butoxide
CAS No.	22411-22-9
Molecular Formula	C₁₆H₃₆HfO₄
Molecular Weight	442.94 g/mol
Synonyms	Hafnium(IV) butoxide; Hafnium tetrabutoxide; Tetran-butyl hafnate; Butyl hafnate; Hafnium butylate; Hf(OBu)₄; Hafnium(4+) tetrabutanolate
EINECS	Contact for details

Quality Control

Our Hafnium n-Butoxide is produced and handled under strict quality management protocols to ensure batch-to-batch consistency and high purity suitable for demanding electronic applications. Each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing key parameters such as assay, metal content, and impurity profiles. We support compliance with relevant industry standards and can provide material tailored to specific customer requirements.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and must be handled under an inert atmosphere (e.g., nitrogen or argon) to prevent decomposition.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms
Assay (Hf content)	≥ 99.9% (metals basis)
Purity (HPLC)	≥ 99.5%
Density (at 20°C)	~1.2 g/mL
Trace Metals (ICP-MS)	As per customer grade requirement

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.