Description

6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonic Acid Ester With 3,3'-Bis(2-Hydroxy-5-Methylbenzyl)-4,4'-Dihydroxy-5,5'- Dimethyldiphenylmethane is a specialized diazonaphthoquinone sulfonate ester, a key functional compound in advanced photoresist formulations. Its primary value lies in its role as a photoactive compound (PAC), which undergoes a solubility change upon exposure to specific wavelengths of light, enabling high-resolution pattern transfer. This chemical is essential for manufacturers in the semiconductor and microelectronics industries, particularly for producing integrated circuits, flat panel displays, and other precision microfabricated components.

Application

• Photoresist Formulations: Serves as a critical photoactive component (PAC) in positive-tone photoresists for semiconductor lithography.
• Semiconductor Manufacturing: Used in the photolithography process for patterning silicon wafers during the fabrication of integrated circuits (ICs).
• Advanced Packaging: Applied in technologies like fan-out wafer-level packaging (FOWLP) and 2.5D/3D integration for creating fine interconnects.
• Flat Panel Display (FPD) Production: Enables the patterning of thin-film transistors (TFTs) and color filters for LCD and OLED displays.
• Micro-Electro-Mechanical Systems (MEMS): Facilitates the creation of intricate mechanical and electromechanical structures on a microscopic scale.
• Printed Circuit Board (PCB) Fabrication: Used in high-density interconnect (HDI) PCB manufacturing for defining ultra-fine circuit traces.

Basic Information

Item	Details
Product Name	6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonic Acid Ester With 3,3'-Bis(2-Hydroxy-5-Methylbenzyl)-4,4'-Dihydroxy-5,5'- Dimethyldiphenylmethane
CAS No.	167933-51-9
Molecular Formula	Contact for details
Molecular Weight	Contact for details
Synonyms	DNQ Sulfonate Ester; PAC (Photoactive Compound); Diazonaphthoquinone Sulfonate Ester; 2-Diazo-1-naphthol-5-sulfonate ester; Photoresist sensitizer; Photoacid generator precursor; Novolak-based photoactive compound; Light-sensitive ester.
EINECS	Contact for details

Quality Control

Our production of this high-purity photoactive compound adheres to stringent quality protocols to ensure batch-to-batch consistency critical for lithographic performance. Quality is verified through advanced analytical techniques including HPLC, NMR, and FT-IR. A comprehensive Certificate of Analysis (COA) detailing purity, impurity profile, and performance-related specifications is provided with every shipment to support your quality management system.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). The container should be kept in a dark environment or in amber glass/or light-blocking packaging to prevent photodegradation. Keep away from heat sources and incompatible materials.

Specification

Item	Specification
Appearance	Yellow to light brown powder or solid
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Moisture Content (KF)	≤ 1.0%
Residue on Ignition	≤ 0.5%
Heavy Metals (as Pb)	≤ 20 ppm
Photosensitivity	Conforms to reference standard

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.