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Naphthoquinone Diazide Ester Derivative CAS NO 134290-56-5
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CAS No.:134290-56-5
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
Naphthoquinone Diazide Ester Derivative CAS NO 134290-56-5 is a specialized photosensitive compound belonging to the diazonaphthoquinone (DNQ) family, a critical class of chemicals in advanced material science. Its primary value lies in its ability to act as a dissolution inhibitor, undergoing a photochemical Wolff rearrangement upon exposure to specific wavelengths of light. This property makes it indispensable for industries requiring high-precision patterning and imaging. Key industrial users include manufacturers of photoresists for semiconductor fabrication, advanced printing plates, and other photoactive polymeric systems.
Application
- Photoresist Formulations: A key component in positive-tone photoresists for semiconductor manufacturing and microelectronics.
- Printing Plate Production: Used in the photosensitive layer of high-resolution offset printing plates.
- Advanced Lithography: Employed in chemical amplification resist systems for deep-UV and other next-generation lithography processes.
- Photoimageable Coatings: Serves as a photoactive compound (PAC) in coatings for printed circuit boards (PCBs) and micro-optics.
- Polymer Modification: Used to impart photosensitivity to various polymers for specialized applications.
- Research & Development: A vital reagent in academic and industrial R&D for developing new photofunctional materials.
Basic Information
| Item | Detail |
|---|---|
| Product Name | Naphthoquinone Diazide Ester Derivative |
| CAS No. | 134290-56-5 |
| Molecular Formula | Contact for details |
| Molecular Weight | Contact for details |
| Synonyms | DNQ Ester Derivative; Diazonaphthoquinone Sulfonate Ester; Photosensitive DNQ Compound; NQD Derivative; Photoactive Compound (PAC); Naphthoquinone-1,2-diazide-5-sulfonic Acid Ester (varies by substitution); Positive Photoresist Component |
| EINECS | Contact for details |
Quality Control
Our Naphthoquinone Diazide Ester Derivative is manufactured under strict quality management protocols to ensure batch-to-batch consistency and high purity, which is critical for photoresist performance. Quality is verified through a battery of analytical techniques including HPLC, NMR, and FT-IR. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and performance-related specifications is provided with each shipment to support your quality assurance and regulatory needs.
Storage
Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place. Due to its strictly light-sensitive and hygroscopic nature, the container must be kept sealed under an inert atmosphere (e.g., nitrogen or argon) at a recommended temperature of 2-8°C for long-term stability. Allow the sealed container to reach room temperature before opening to prevent moisture condensation.
Specification
| Item | Specification |
|---|---|
| Appearance | Yellow to light brown powder or crystalline solid |
| Identification (IR) | Conforms to structure |
| Purity (HPLC) | ≥ 98.0% |
| Moisture Content (KF) | ≤ 0.5% |
| Photosensitivity | Conforms to reference standard |
| Solubility | Soluble in common photoresist solvents (e.g., PGMEA, Ethyl Lactate) |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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