Description

Tetrakis(Diethylamino)Silane is a high-purity organosilicon compound, specifically a tetraaminosilane, that serves as a critical precursor in advanced materials synthesis. Its core value lies in its ability to act as a highly reactive silicon source for depositing ultra-pure silicon nitride (SiN) and silicon oxide (SiO2) thin films via chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. This compound is essential for manufacturers in the semiconductor, photovoltaic, and optical coating industries who require precise, high-performance dielectric and passivation layers.

Application

• Semiconductor Manufacturing: As a key precursor for plasma-enhanced chemical vapor deposition (PECVD) and low-pressure chemical vapor deposition (LPCVD) of silicon nitride and silicon oxide dielectric films in integrated circuit fabrication.
• Photovoltaic Cells: For depositing high-quality silicon nitride anti-reflection and passivation coatings on solar cells to enhance light absorption and efficiency.
• Optical & Protective Coatings: Used in ALD processes to create precise, conformal thin films on lenses, sensors, and other optical components for anti-reflective, scratch-resistant, or barrier properties.
• Microelectromechanical Systems (MEMS): For the deposition of insulating and structural layers in MEMS device manufacturing.
• Surface Modification & Functionalization: As a reactive silane coupling agent to modify surface properties of glass, metals, and ceramics for improved adhesion or hydrophobicity.
• Specialty Polymer Synthesis: As a monomer or cross-linking agent in the synthesis of specialized silicon-containing polymers and hybrid materials.

Basic Information

Product Name	Tetrakis(Diethylamino)Silane
CAS No.	17048-10-1
Molecular Formula	C16H40N4Si
Molecular Weight	316.60 g/mol
Synonyms	Tetrakis(diethylamino)silane; Silicon(IV) tetra(diethylamide); Tetra(diethylamino)silane; TDEAS; Si(NEt2)4; N,N-Diethyl-1,1,1,1-silanetetramine; Silane, tetrakis(diethylamino)-; 1,1,1,1-Tetra(diethylamino)silane
EINECS	241-114-5

Quality Control

Our Tetrakis(Diethylamino)Silane is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity essential for sensitive deposition processes. We provide comprehensive Certificates of Analysis (COA) with each batch, detailing key parameters such as purity, metal impurities, and moisture content. Our quality protocols are designed to meet the stringent requirements of the electronics and semiconductor industries.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, well-ventilated area at temperatures between 2°C and 8°C (refrigerated) or as specified on the label. This product is hygroscopic (moisture-sensitive) and highly volatile. Containers must be kept tightly sealed under an inert atmosphere (argon or nitrogen) to prevent degradation and moisture uptake. Keep away from heat, sparks, and open flame.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms
Assay (GC)	≥ 99.0%
Density (at 20°C)	0.85 - 0.87 g/mL
Refractive Index (n20D)	1.450 - 1.455
Moisture (Karl Fischer)	≤ 50 ppm
Metal Impurities (ICP-MS)	≤ 1 ppm total (Na, K, Ca, Fe, etc.)
Chloride Content	≤ 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.