Description

Triphenylsulfonium 4-Oxo-1-Adamantyloxycarbonyldifluoromethane Sulfonate is a high-purity, advanced photoacid generator (PAG) salt designed for cutting-edge photolithography processes. This compound is critical for enabling high-resolution patterning in the production of next-generation semiconductors and advanced electronic components. It is an essential material for manufacturers and R&D facilities in the semiconductor, microelectronics, and photoresist formulation industries seeking superior performance in deep-UV (DUV) and other high-energy lithography applications.

Application

• Semiconductor Photolithography: A key photoacid generator (PAG) component in chemically amplified resists (CARs) for deep-UV (DUV), KrF, and ArF excimer laser lithography.
• Advanced Microelectronics Fabrication: Enables the high-resolution patterning required for manufacturing integrated circuits (ICs), memory chips, and processors with sub-micron and nanometer-scale features.
• Photoresist Formulation: Used by specialty chemical companies to develop and produce high-performance positive-tone and negative-tone photoresists for the electronics industry.
• Optical Component Manufacturing: Applied in the patterning of micro-optical elements and photonic devices.
• Research & Development: Serves as a critical reagent in academic and industrial R&D for exploring new photopolymerization systems and advanced lithographic techniques.

Basic Information

Product Name	Triphenylsulfonium 4-Oxo-1-Adamantyloxycarbonyldifluoromethane Sulfonate
CAS No.	913269-98-4
Molecular Formula	C30H27F2O6S2
Molecular Weight	609.66 g/mol
Synonyms	Triphenylsulfonium 1-Adamantyloxycarbonyl-1,1-difluoromethanesulfonate; Triphenylsulfonium 4-Oxo-1-adamantyloxycarbonyldifluoromethanesulfonate; ADPF-TPS; 4-Oxo-1-adamantyloxycarbonyl-1,1-difluoromethanesulfonic Acid Triphenylsulfonium Salt; Photoacid Generator PAG; TPS-ADPF; (4-Oxo-1-adamantyl)oxycarbonyl-difluoromethanesulfonate Triphenylsulfonium
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium 4-Oxo-1-Adamantyloxycarbonyldifluoromethane Sulfonate is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity suitable for semiconductor applications. Each lot undergoes rigorous analytical testing, including HPLC, NMR, and ICP-MS, to verify identity, potency, and control of metallic and organic impurities. A comprehensive Certificate of Analysis (COA) detailing all specifications is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and strictly light-sensitive; containers must be kept sealed under an inert atmosphere (e.g., nitrogen or argon) in a desiccated environment to maintain stability and prevent decomposition.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to reference spectrum
Identification (NMR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Specific Metals (ICP-MS)	Na, K, Ca, Fe, each ≤ 5 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.