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4-Benzoyl-2-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate) CAS NO 93965-14-1
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CAS No.:93965-14-1
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
4-Benzoyl-2-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate) is a specialized diazonaphthoquinone (DNQ) derivative, a critical class of compounds in advanced photoresist formulations. This product matters for its role as a high-performance photoactive compound (PAC), enabling precise pattern transfer in microelectronics manufacturing. Industrial R&D and production teams in the semiconductor and advanced photopolymer sectors require this chemical for developing next-generation photolithography materials.
Application
- As a key photoactive component (PAC) in chemical amplification and g/i-line photoresists for semiconductor fabrication.
- In the formulation of high-resolution photoresists used for integrated circuits (ICs) and microelectromechanical systems (MEMS).
- For research and development of novel photopolymer systems requiring specific dissolution inhibition properties.
- As a specialty chemical intermediate in synthesizing advanced, custom photoactive compounds.
- In the production of printing plates and other imaging materials that rely on photo-induced chemical changes.
- For analytical and QC reference standards in photoresist manufacturing and quality control laboratories.
Basic Information
| Product Name | 4-Benzoyl-2-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate) |
| CAS No. | 93965-14-1 |
| Molecular Formula | C34H18N4O11S2 |
| Molecular Weight | 722.66 g/mol |
| Synonyms | 2,2'-((4-Benzoyl-2-hydroxy-1,3-phenylene)bis(oxy))bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonic acid); DNQ Photoactive Compound; PAC Derivative; 1,3-Bis(6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonyloxy)-5-benzoyl-2-hydroxybenzene; Diazonaphthoquinone Sulfonate Ester; Photoresist Sensitizer; Photoacid Generator Precursor |
| EINECS | Contact for details |
Quality Control
Our production of this high-purity photoactive compound adheres to strict quality management protocols to ensure batch-to-batch consistency critical for photolithography performance. Quality is verified through advanced analytical techniques including HPLC, NMR, and FT-IR. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and performance-related specifications is provided with each shipment to support your quality assurance and regulatory needs.
Storage
Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is light-sensitive (store away from light). Keep the container tightly sealed in a dry environment to prevent moisture uptake and decomposition.
Specification
| Item | Specification |
|---|---|
| Appearance | Yellow to orange powder or crystalline solid |
| Identification (IR) | Conforms to structure |
| Purity (HPLC) | ≥ 98.0% |
| Water Content (KF) | ≤ 1.0% |
| Residue on Ignition | ≤ 0.5% |
| Heavy Metals (as Pb) | ≤ 20 ppm |
| Performance Test (UV-Vis) | Conforms to reference |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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Each batch undergoes strict QC, accompanied by COA, MSDS, and full compliance with international standards.
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