share

4-Benzoyl-2-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate) CAS NO 93965-14-1


Unit Price:

CAS No.:93965-14-1

Grade:Pharmacy Grade

Content:99.9%

Brand:Customizable

Packaging:Customizable

Description

4-Benzoyl-2-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate) is a specialized diazonaphthoquinone (DNQ) derivative, a critical class of compounds in advanced photoresist formulations. This product matters for its role as a high-performance photoactive compound (PAC), enabling precise pattern transfer in microelectronics manufacturing. Industrial R&D and production teams in the semiconductor and advanced photopolymer sectors require this chemical for developing next-generation photolithography materials.

Application

  • As a key photoactive component (PAC) in chemical amplification and g/i-line photoresists for semiconductor fabrication.
  • In the formulation of high-resolution photoresists used for integrated circuits (ICs) and microelectromechanical systems (MEMS).
  • For research and development of novel photopolymer systems requiring specific dissolution inhibition properties.
  • As a specialty chemical intermediate in synthesizing advanced, custom photoactive compounds.
  • In the production of printing plates and other imaging materials that rely on photo-induced chemical changes.
  • For analytical and QC reference standards in photoresist manufacturing and quality control laboratories.

Basic Information

Product Name 4-Benzoyl-2-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate)
CAS No. 93965-14-1
Molecular Formula C34H18N4O11S2
Molecular Weight 722.66 g/mol
Synonyms 2,2'-((4-Benzoyl-2-hydroxy-1,3-phenylene)bis(oxy))bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonic acid); DNQ Photoactive Compound; PAC Derivative; 1,3-Bis(6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonyloxy)-5-benzoyl-2-hydroxybenzene; Diazonaphthoquinone Sulfonate Ester; Photoresist Sensitizer; Photoacid Generator Precursor
EINECS Contact for details

Quality Control

Our production of this high-purity photoactive compound adheres to strict quality management protocols to ensure batch-to-batch consistency critical for photolithography performance. Quality is verified through advanced analytical techniques including HPLC, NMR, and FT-IR. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and performance-related specifications is provided with each shipment to support your quality assurance and regulatory needs.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is light-sensitive (store away from light). Keep the container tightly sealed in a dry environment to prevent moisture uptake and decomposition.

Specification

Item Specification
Appearance Yellow to orange powder or crystalline solid
Identification (IR) Conforms to structure
Purity (HPLC) ≥ 98.0%
Water Content (KF) ≤ 1.0%
Residue on Ignition ≤ 0.5%
Heavy Metals (as Pb) ≤ 20 ppm
Performance Test (UV-Vis) Conforms to reference

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.

Complete Your RFQ

0/ 2000

Why choose US

Trusted Manufacturer

With our own production facilities, we ensure consistent quality, reliable supply, and full traceability.

Rigorous Quality Assurance

Each batch undergoes strict QC, accompanied by COA, MSDS, and full compliance with international standards.

Advanced R&D Expertise

Our in-house lab drives process innovation, new product development, and tailored synthesis solutions.