Description

o-Tolyl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate is a specialized diazonaphthoquinone sulfonate ester, a key photochemical intermediate in advanced manufacturing processes. This compound matters for its role as a critical photoactive component in high-resolution photoresist formulations, enabling precise pattern generation. Industries requiring microfabrication, such as semiconductor manufacturing and advanced electronics, need this chemical for producing integrated circuits and microelectromechanical systems (MEMS).

Application

• Photoresist Formulation: Serves as a primary photoactive compound (PAC) in positive-tone photoresists for semiconductor lithography.
• Microelectronics Fabrication: Used in the production of integrated circuits (ICs), printed circuit boards (PCBs), and other microelectronic components.
• Advanced Packaging: Enables fine-pitch patterning in wafer-level packaging (WLP) and through-silicon via (TSV) technologies.
• Optical Device Manufacturing: Applied in the creation of micro-optical elements, diffraction gratings, and photomasks.
• Research & Development: Utilized in academic and industrial R&D for developing next-generation photopolymer materials and nano-patterning techniques.
• Chemical Synthesis: Acts as a precursor or intermediate in the synthesis of more complex, functionalized organic molecules and dyes.

Basic Information

Product Name	o-Tolyl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate
CAS No.	83803-86-5
Molecular Formula	C₁₇H₁₂N₂O₄S
Molecular Weight	340.35 g/mol
Synonyms	2-Methylphenyl 6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonate; 6-Diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonic Acid o-Tolyl Ester; DNQ Sulfonate Ester; Photoactive Compound; PAC; Diazonaphthoquinone Sulfonate; o-Cresyl DNQ Sulfonate; 1,2-Naphthoquinonediazide-5-sulfonic Acid 2-Methylphenyl Ester
EINECS	Contact for details

Quality Control

Our o-Tolyl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity, critical for photolithography performance. Products undergo rigorous analytical testing, including HPLC for assay and impurity profiling, to ensure compliance with stringent industry standards for electronic chemicals. Certificates of Analysis (COA) detailing purity, identity, and performance-related parameters are available for every batch upon request.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at a controlled room temperature (15-25°C). This material is light-sensitive (store away from light). Keep away from heat, sparks, and open flame. For long-term storage, consider storage under an inert atmosphere to maximize shelf-life stability.

Specification

Item	Specification
Appearance	Yellow to orange crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Related Substances (HPLC)	Individual impurity ≤ 0.5%; Total impurities ≤ 1.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.