Description

Cresol-Formaldehyde Copolymer 1,2-Naphthoquinonediazido-4-Sulfonate is a high-performance, specialty polymeric photoresist resin. This compound is a critical component in the formulation of advanced photoresists, valued for its excellent photosensitivity and film-forming properties. It is primarily required by manufacturers in the semiconductor and microelectronics industries for photolithography processes.

Application

• Semiconductor Photolithography: A key resin component in positive-tone photoresist formulations for integrated circuit (IC) manufacturing.
• Advanced Packaging: Used in photoresists for wafer-level packaging (WLP), fan-out wafer-level packaging (FOWLP), and through-silicon via (TSV) processes.
• Micro-Electro-Mechanical Systems (MEMS): Essential for patterning high-resolution features in MEMS device fabrication.
• Flat Panel Display (FPD) Production: Employed in photoresists for manufacturing thin-film transistor (TFT) arrays and color filters.
• Printed Circuit Board (PCB) Imaging: Used in high-density interconnect (HDI) PCB photoresists for creating fine-line circuitry.
• Research & Development: Serves as a critical material for R&D in next-generation photoresist chemistry for EUV and other advanced lithography nodes.

Basic Information

Product Name	Cresol-Formaldehyde Copolymer 1,2-Naphthoquinonediazido-4-Sulfonate
CAS No.	80296-78-2
Molecular Formula	Contact for details
Molecular Weight	Contact for details
Synonyms	Novolac-Diazonaphthoquinone Resin; DNQ-Novolac Resin; Photoactive Compound (PAC)-Novolac; Poly[(4-hydroxyphenyl)methylylidene] 1,2-Naphthoquinonediazido-4-Sulfonate; Photoresist Resin; I-Line Photoresist Resin; G-line Photoresist Resin; Positive Photoresist Polymer
EINECS	Contact for details

Quality Control

Our Cresol-Formaldehyde Copolymer 1,2-Naphthoquinonediazido-4-Sulfonate is manufactured under strict quality management systems. Each batch undergoes rigorous analytical testing, including spectroscopic identification and purity assays, to ensure consistency and performance for critical photolithography applications. A comprehensive Certificate of Analysis (COA) detailing lot-specific results is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). Due to its hygroscopic and strictly light-sensitive nature, the container must be kept sealed under dry, inert conditions when not in use to prevent moisture absorption and photochemical decomposition.

Specification

Item	Specification
Appearance	Yellow to light brown powder or solid
Identification (IR)	Conforms to structure
Assay (Active Ester Content)	Contact for details
Purity (HPLC)	≥ 95%
Moisture Content (KF)	≤ 1.0%
Solubility	Soluble in common photoresist solvents (e.g., PGMEA, EL)

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.