Description

Triphenylsulfonium Salt With α,α-Difluorobicyclo[2.2.1]Heptane-2-Ethanesulfonic Acid (1:1) is a high-purity photoacid generator (PAG) salt, a critical component for advanced photoresist formulations. Its value lies in its ability to generate strong acid upon exposure to deep ultraviolet (DUV) or electron beam (e-beam) radiation, enabling precise patterning in microelectronics manufacturing. This compound is essential for semiconductor fabricators and advanced material scientists developing next-generation integrated circuits and nanoscale devices.

Application

• Semiconductor Photolithography: A key photoacid generator (PAG) in chemically amplified resists (CARs) for DUV (248nm, 193nm) and e-beam lithography processes.
• Advanced Packaging: Used in the fabrication of redistribution layers (RDLs), through-silicon vias (TSVs), and other fine-feature interconnects.
• Micro-Electro-Mechanical Systems (MEMS): Enables high-resolution patterning for creating intricate mechanical and sensor structures on silicon wafers.
• Photomask Production: Critical for manufacturing high-precision photomasks used in semiconductor and display panel production.
• Nanofabrication Research: Serves as a research-grade PAG for developing novel resist materials and lithographic techniques in academic and R&D settings.
• Optical Component Manufacturing: Applied in the patterning of waveguides, diffractive optical elements, and other micro-optical structures.

Basic Information

Product Name	Triphenylsulfonium Salt With α,α-Difluorobicyclo[2.2.1]Heptane-2-Ethanesulfonic Acid (1:1)
CAS No.	757235-57-7
Molecular Formula	C27H26F2O3S2
Molecular Weight	500.62 g/mol
Synonyms	Triphenylsulfonium α,α-Difluoro-2-norbornanesulfonate; Triphenylsulfonium DFBNS; TPS-DFBNS; Triphenylsulfonium 1,3-Difluoro-2-norbornanesulfonate; Photoacid Generator PAG 1; (1R,4S)-1,3-Difluoro-7,7-dimethyl-2-oxobicyclo[2.2.1]heptane-1-methanesulfonate triphenylsulfonium; Triphenylsulfonium 1,3-Difluoro-7,7-dimethyl-2-oxobicyclo[2.2.1]heptane-1-methanesulfonate
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium Salt is manufactured under strict quality management systems to ensure batch-to-batch consistency critical for photolithographic performance. Each lot undergoes comprehensive analytical testing, including HPLC for purity and impurity profiling, NMR for structural confirmation, and KF titration for moisture content. Certificates of Analysis (COA) detailing all specifications are provided and can be tailored to meet specific customer or ISO quality protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is strictly light-sensitive and must be protected from all light exposure during storage and handling to prevent decomposition. Keep the container tightly sealed in a dry environment to minimize moisture uptake.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to reference spectrum
Identification (NMR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Related Substances (HPLC)	Total impurities ≤ 1.0%
Water Content (KF)	≤ 0.5% w/w
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 20 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.