Description

Propyl 3,4,5-Tris[[(6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthyl)Sulphonyl]Oxy]Benzoate is a specialized, high-molecular-weight diazonaphthoquinone (DNQ) derivative, a critical class of compounds in advanced material science. This compound matters for its role as a highly effective photoactive compound (PAC), enabling precise patterning in microelectronics manufacturing. It is primarily needed by manufacturers of photoresists for semiconductor lithography and other industries requiring high-resolution, light-sensitive coatings.

Application

• Photoresist Formulation: A key photoactive component in chemical amplification and g/i-line photoresists for semiconductor and microchip fabrication.
• Semiconductor Lithography: Used in the production of integrated circuits (ICs), memory chips, and other microelectronic devices to create precise circuit patterns.
• Printed Circuit Board (PCB) Manufacturing: Employed in photoresist layers for defining fine-line conductive traces on PCBs.
• Advanced Packaging: Facilitates patterning in wafer-level packaging (WLP) and through-silicon via (TSV) technologies.
• Optical Component Fabrication: Used in the production of micro-optical elements, diffraction gratings, and other precision optical devices.
• Research & Development: Serves as a critical reagent in academic and industrial R&D for developing next-generation photopolymer materials and lithographic processes.

Basic Information

Product Name	Propyl 3,4,5-Tris[[(6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthyl)Sulphonyl]Oxy]Benzoate
CAS No.	73003-79-9
Molecular Formula	C46H28N6O17S3
Molecular Weight	1033.00 g/mol
Synonyms	Propyl 3,4,5-Tris[(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyl)oxy]benzoate; 1,2-Naphthoquinonediazide-5-sulfonic Acid Tris(3,4,5-tris(propoxycarbonyl)phenyl) Ester; DNQ PAC; Photoactive Compound 73003-79-9; Tris-DNQ Ester; Lithographic Photoacid Generator Precursor; 3,4,5-Tris({[6-diazo-5-oxo-5,6-dihydronaphthalen-1-yl]sulfonyl}oxy)benzoic Acid Propyl Ester
EINECS	Contact for details

Quality Control

Our production of this high-purity photoactive compound adheres to strict quality management protocols to ensure batch-to-batch consistency critical for lithographic performance. Quality is verified through advanced analytical techniques including HPLC for purity and assay, spectroscopic identification (IR, NMR), and control of residual solvents and metallic impurities. A comprehensive Certificate of Analysis (COA) detailing all specifications is provided with each shipment to support your quality assurance and regulatory compliance.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is light-sensitive (store away from light) and should be handled under appropriate conditions to prevent premature decomposition. Keep the container sealed in a dry environment to minimize exposure to moisture.

Specification

Item	Specification
Appearance	Yellow to light brown powder or crystalline solid
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0% (Area %)
Water Content (KF)	≤ 0.5%
Residual Solvents (GC)	Meets ICH guidelines
Heavy Metals	≤ 10 ppm
Specific Impurities (HPLC)	Individual unspecified impurity ≤ 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.