Description

6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonic Acid 4-(1-Methyl-1-Phenylethyl)Phenyl Ester is a specialized diazonaphthoquinone (DNQ) derivative, a critical class of compounds in advanced material science. Its primary value lies in its function as a highly effective photoactive compound (PAC), essential for generating precise chemical changes upon exposure to specific light wavelengths. This product is indispensable for manufacturers in the electronics and photoresist industries, where it is used to formulate high-resolution, chemically amplified photoresists for semiconductor and printed circuit board (PCB) fabrication.

Application

• Photoresist Formulation: A key photoactive component in positive-tone and chemically amplified photoresists for semiconductor lithography.
• Printed Circuit Board (PCB) Manufacturing: Used in photoresist coatings for creating fine-line circuit patterns on PCB substrates.
• Advanced Packaging: Enables high-density interconnects and micro-bump patterning in 2.5D and 3D integrated circuit packaging.
• Micro-Electro-Mechanical Systems (MEMS): Facilitates the patterning of intricate microstructures on silicon wafers.
• Optical Component Fabrication: Applied in the production of diffraction gratings, waveguides, and other micro-optical elements.
• Research & Development: Serves as a precursor or intermediate in the synthesis of novel photoactive materials and polymers for academic and industrial R&D.

Basic Information

Product Name	6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonic Acid 4-(1-Methyl-1-Phenylethyl)Phenyl Ester
CAS No.	71728-47-7
Molecular Formula	C25H20N2O5S
Molecular Weight	460.50 g/mol
Synonyms	4-(1-Methyl-1-phenylethyl)phenyl 6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonate; DNQ Photoactive Compound; PAC 71728-47-7; 2-Diazo-1-naphthol-5-sulfonate ester; Diazonaphthoquinone sulfonate ester; Photoacid generator precursor; Lithography chemical 71728-47-7
EINECS	Contact for details

Quality Control

Our production of this high-purity photoactive compound adheres to stringent quality protocols. Every batch is characterized using advanced analytical techniques including HPLC, NMR, and FT-IR to ensure structural integrity and purity. We provide comprehensive Certificates of Analysis (COA) with each shipment, detailing key parameters such as assay, impurity profile, and performance in standard lithographic tests. Our quality system is designed to meet the exacting standards of the semiconductor and electronics industries.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This compound is light-sensitive (store away from light) and easily oxidized (store under inert atmosphere). For long-term storage, consider packaging under an inert gas such as nitrogen or argon in amber glass containers. Keep away from heat and incompatible materials.

Specification

Item	Specification
Appearance	Yellow to light brown crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Performance in Resist Formulation	Contact for details

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.