Description

Fluorotris(Dimethylamino)Silane is a highly reactive organosilicon compound that serves as a versatile precursor for silicon nitride and silicon oxide thin films. Its value lies in its role as a key chemical vapor deposition (CVD) and atomic layer deposition (ALD) source material, enabling precise, high-purity film growth. This product is essential for manufacturers in the semiconductor, photovoltaic, and advanced ceramics industries who require high-performance dielectric and passivation layers.

Application

• Semiconductor Manufacturing: As a precursor for silicon nitride (SiNx) and silicon oxynitride (SiON) thin films via CVD and ALD processes for gate dielectrics and passivation layers.
• Photovoltaics: Used in the deposition of anti-reflective and passivation coatings on solar cells to enhance efficiency and durability.
• Optical Coatings: Serves as a source material for high-quality silicon-based optical thin films on lenses and other precision components.
• Protective Coatings: Applied in the creation of hard, chemically resistant silicon nitride coatings on various substrates.
• Ceramics & Composites: Acts as a pre-ceramic polymer for producing silicon nitride fibers and matrix materials in advanced composites.
• Surface Modification: Utilized in surface functionalization to introduce specific reactive groups onto silicon-based materials.

Basic Information

Product Name	Fluorotris(Dimethylamino)Silane
CAS No.	680-32-0
Molecular Formula	C6H19FN3Si
Molecular Weight	165.32 g/mol
Synonyms	Tris(dimethylamino)fluorosilane; Fluorotris(dimethylamino)silicon; (Dimethylamino)fluorosilane; FSi(N(CH3)2)3; Fluorotris(dimethylamino)silane; Fluorotris(dimethylamino)silane (F-TDMAS); F-TDMAS; Tris(dimethylamino)fluorosilane
EINECS	211-672-8

Quality Control

Our Fluorotris(Dimethylamino)Silane is produced and handled under strict quality management systems to ensure batch-to-batch consistency and high purity, critical for sensitive deposition processes. Each lot is analyzed to meet stringent specifications for electronic or semiconductor grade materials. A comprehensive Certificate of Analysis (COA) detailing purity, impurity profiles, and physical properties is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, well-ventilated area at room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and must be kept under an inert atmosphere (e.g., nitrogen or argon) to prevent decomposition. Keep away from heat, sparks, open flames, and strong oxidizing agents.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms
Assay (GC)	≥ 98.0 %
Density (at 20°C)	0.88 - 0.92 g/mL
Refractive Index (n20D)	1.420 - 1.430
Moisture (Karl Fischer)	≤ 50 ppm
Metal Impurities (ICP-MS)	≤ 10 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.