Description

Triphenylsulfonium Hydroxide is a strong organic base, widely recognized for its role as a key photoacid generator (PAG) precursor. This compound matters for its ability to generate strong acids upon exposure to light, which is critical for driving high-precision chemical reactions in advanced manufacturing. It is primarily needed by the electronics and specialty chemical industries for applications in photoresist formulations and as a catalyst in organic synthesis.

Application

• Primary component in the synthesis of photoacid generators (PAGs) for chemically amplified photoresists used in semiconductor and microelectronics fabrication.
• Catalyst for epoxy curing and other polymerization reactions in high-performance coatings and adhesives.
• Reagent in organic synthesis, particularly for alkylation and esterification reactions requiring a strong, non-nucleophilic base.
• Key ingredient in the formulation of advanced lithographic materials for next-generation integrated circuit (IC) production.
• Used in research and development of photo-patternable polymers for micro-optics and MEMS devices.
• Potential use as an initiator or catalyst in specialty polymer production.

Basic Information

Product Name	Triphenylsulfonium Hydroxide
CAS No.	58621-56-0
Molecular Formula	C18H16OS
Molecular Weight	280.38 g/mol
Synonyms	Triphenylsulfonium hydroxide; Sulfonium, triphenyl-, hydroxide; Hydroxytriphenylsulfonium; TPS-OH; Triphenylsulfanolium hydroxide; Photoacid Generator Precursor; PAG Precursor; Triphenylsulfonium ion hydroxide
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium Hydroxide is manufactured under strict quality management systems. Each batch undergoes rigorous analytical testing, including HPLC for purity and identity confirmation, to ensure it meets the high standards required for electronics-grade applications. A comprehensive Certificate of Analysis (COA) detailing purity, assay, and impurity profiles is provided with every shipment and is available upon request.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). Due to its strong alkaline nature and light sensitivity, prolonged exposure to light, moisture, or incompatible materials should be avoided.

Specification

Item	Specification
Appearance	White to off-white crystalline powder or solution
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Purity (HPLC Area %)	≥ 99.0%
Water Content (KF)	≤ 0.5%
Heavy Metals (as Pb)	≤ 10 ppm
Residual Solvents (GC)	Meets ICH guidelines

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.