Description

4'-(Isopropyl)[1,1'-Biphenyl]Yl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate is a specialized diazonaphthoquinone sulfonate derivative, a key functional compound in advanced material synthesis. Its value lies in its role as a highly effective photoactive component for generating precise chemical patterns upon exposure to light. This product is essential for manufacturers in the electronics and photoresist industries, where it is used to create high-resolution circuit boards and semiconductor components.

Application

• Photoresist Formulation: A critical photoacid generator (PAG) in chemical amplification resists for deep-UV, i-line, and g-line lithography in semiconductor manufacturing.
• Printed Circuit Board (PCB) Fabrication: Used in photoresist layers for creating precise conductive pathways on circuit boards.
• Advanced Material Synthesis: Serves as a key intermediate or functional additive in the development of novel polymers and light-sensitive coatings.
• Optical Component Manufacturing: Employed in the production of diffraction gratings, waveguides, and other micro-optical elements.
• Research & Development: Utilized in academic and industrial R&D for exploring new photochemical reactions and material properties.

Basic Information

Product Name	4'-(Isopropyl)[1,1'-Biphenyl]Yl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate
CAS No.	50764-82-4
Molecular Formula	C26H22N2O4S
Molecular Weight	458.53 g/mol
Synonyms	4'-Isopropylbiphenyl-4-yl 6-diazo-5,6-dihydro-5-oxonaphthalene-1-sulfonate; 4-(1-Methylethyl)[1,1'-biphenyl]-4-yl 6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonate; DNQ Sulfonate Ester; Photoactive Compound (PAC); Diazonaphthoquinone Sulfonate Ester; 4'-Isopropyl-4-biphenylyl 6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonate; 4'-Isopropylbiphenyl-4-yl 6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonate
EINECS	Contact for details

Quality Control

Our production of 4'-(Isopropyl)[1,1'-Biphenyl]Yl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate adheres to stringent quality protocols to ensure batch-to-batch consistency and performance reliability for critical photolithography applications. Each lot undergoes comprehensive analysis, including HPLC for purity and assay and spectroscopic identification (IR, NMR). Certificates of Analysis (COA) detailing all specifications are provided to guarantee the material meets the exacting standards required for electronics-grade chemicals.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This compound is light-sensitive (store away from light) and should be handled under appropriate conditions to prevent premature decomposition. Keep the container tightly sealed in a dry environment to minimize exposure to moisture.

Specification

Item	Specification
Appearance	Yellow to light brown crystalline powder
Identification (IR)	Conforms to reference spectrum
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.