Description

2-Methoxyethyl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate is a specialized diazonaphthoquinone (DNQ) derivative, a critical class of compounds in advanced material science. Its primary value lies in its function as a highly effective photoactive compound (PAC) for generating precise chemical patterns upon exposure to light. This product is essential for manufacturers and R&D teams in the semiconductor and electronics industries, where it is used to formulate high-resolution photoresists for microchip fabrication.

Application

• Photoresist Formulation: A key photoactive component in positive-tone photoresists for semiconductor lithography, enabling the patterning of integrated circuits.
• Advanced Electronics Manufacturing: Used in the production of printed circuit boards (PCBs), flat panel displays, and micro-electromechanical systems (MEMS).
• Optical Material Development: Serves as a precursor or functional additive in the synthesis of advanced polymers and coatings with light-sensitive properties.
• Chemical Synthesis: Acts as a versatile diazo transfer reagent or intermediate in organic synthesis for creating complex molecular architectures.
• Research & Development: Utilized in academic and industrial labs for developing next-generation photolithographic processes and novel photo-responsive materials.

Basic Information

Product Name	2-Methoxyethyl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate
CAS No.	42372-33-8
Molecular Formula	C₁₄H₁₄N₂O₆S
Molecular Weight	338.34 g/mol
Synonyms	2-Methoxyethyl 6-diazo-5-oxo-5,6-dihydronaphthalene-1-sulfonate; 2-Methoxyethyl ester of 6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonic acid; DNQ Sulfonate Ester; Photoactive Compound (PAC); Naphthoquinone-1,2-diazide-5-sulfonate ester; 1,2-Naphthoquinonediazide-5-sulfonic acid 2-methoxyethyl ester; 42372-33-8; 6-Diazo-5,6-dihydro-5-oxonaphthalene-1-sulfonic acid 2-methoxyethyl ester
EINECS	Contact for details

Quality Control

Our 2-Methoxyethyl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate is produced under strict quality management systems to ensure batch-to-batch consistency and high purity, critical for sensitive photolithographic applications. All materials undergo rigorous analytical testing, including HPLC for assay and purity, and spectroscopic methods for structural confirmation. A comprehensive Certificate of Analysis (COA) detailing identity, purity, and impurity profiles is provided with every shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at a controlled room temperature (15-25°C). This compound is light-sensitive (store away from light) and should be handled under appropriate conditions to maintain stability and performance. Keep away from heat sources and incompatible materials.

Specification

Item	Specification
Appearance	Yellow to orange crystalline powder or solid
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Related Substances (HPLC)	Total impurities ≤ 2.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.