Description

Tetrakis(1-Methoxy-2-Methyl-2-Propoxy)Hafnium is a high-purity, organometallic hafnium complex used as a precursor in advanced material deposition processes. Its value lies in its ability to deliver hafnium with high efficiency and purity under controlled conditions, which is critical for achieving precise film properties. This compound is essential for manufacturers in the semiconductor and electronics industries, particularly for producing high-k dielectric layers in next-generation microprocessors and memory devices.

Application

• Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) of hafnium oxide (HfO₂) high-k dielectric films for semiconductor gate stacks.
• Fabrication of advanced memory devices, including DRAM and Flash memory, requiring precise thin-film dielectrics.
• Deposition of optical coatings and protective layers where high refractive index and thermal stability are required.
• Research and development of novel metal-organic frameworks (MOFs) and catalytic systems utilizing hafnium centers.
• As a specialized precursor in the production of specialty ceramics and composite materials.

Basic Information

Product Name	Tetrakis(1-Methoxy-2-Methyl-2-Propoxy)Hafnium
CAS No.	309915-48-8
Molecular Formula	C20H44HfO8
Molecular Weight	623.06 g/mol
Synonyms	Hafnium(IV) tert-butoxide methoxy derivative; Hafnium(IV) 1-methoxy-2-methyl-2-propoxide; Hf(mmp)₄; Hf(OtBuOMe)₄; Tetrakis(1-methoxy-2-methyl-2-propanolato)hafnium(IV); Hafnium tetra(1-methoxy-2-methyl-2-propoxide); Hafnium MMP precursor; TEMAHf (common industry abbreviation)
EINECS	Contact for details

Quality Control

Our Tetrakis(1-Methoxy-2-Methyl-2-Propoxy)Hafnium is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity, meeting the stringent requirements of the electronics industry. Each lot is supported by a comprehensive Certificate of Analysis (COA) detailing key parameters such as hafnium content, trace metal impurities, and solvent residues. We adhere to relevant industry standards and can provide material tailored to specific customer specifications.

Storage

Preserve in a tightly closed container, protected from light. Due to its properties of being easily oxidized (store under inert atmosphere) and hygroscopic (moisture-sensitive), this material must be stored under a dry, inert gas (argon or nitrogen) in a cool, dry place. Recommended storage temperature is 2-8°C. The container should be kept tightly sealed when not in use to minimize exposure to air and moisture. Handle in a well-ventilated area or under an inert atmosphere.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms to reference spectrum
Assay (Hf content)	≥ 99.9% (metals basis)
Purity (GC)	≥ 99.5%
Density (at 20°C)	~1.1 g/mL
Trace Metals (ICP-MS)	< 10 ppm total
Chloride (Cl)	< 50 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.