Description

Bis(T-Butylcyclopentadienyl)Hafnium Dichloride is a highly specialized organometallic compound, primarily used as a precursor in advanced materials synthesis. Its value lies in its role as a high-purity source of hafnium for depositing hafnium-containing thin films, which are critical for modern electronics. This product is essential for manufacturers and R&D facilities in the semiconductor, catalysis, and specialty chemical industries seeking reliable, high-performance materials.

Application

• Semiconductor Manufacturing: As a key precursor for Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes to create high-k dielectric hafnium oxide (HfO₂) films in advanced microchips.
• Catalysis Research: Serving as a catalyst precursor or ligand in organometallic chemistry for the development of novel polymerization and organic synthesis reactions.
• Thin Film Deposition: For the production of hafnium-based coatings on various substrates, enhancing surface properties for optical or protective applications.
• Materials Science R&D: As a starting material for synthesizing novel hafnium-containing complexes, nanoparticles, and advanced ceramic materials.
• Specialty Chemical Synthesis: Used in the preparation of other organohafnium compounds for specialized industrial and research applications.

Basic Information

Product Name	Bis(T-Butylcyclopentadienyl)Hafnium Dichloride
CAS No.	33010-55-8
Molecular Formula	C₁₈H₂₆Cl₂Hf
Molecular Weight	495.21 g/mol
Synonyms	Bis(tert-butylcyclopentadienyl)hafnium dichloride; Hafnocene dichloride, tert-butyl substituted; Di(tert-butylcyclopentadienyl)hafnium(IV) dichloride; (tBuCp)₂HfCl₂; Hf(tBuC₅H₄)₂Cl₂; Bis(1,1-dimethylethylcyclopentadienyl)hafnium dichloride; Hafnium, dichlorobis[(1,1-dimethylethyl)cyclopentadienyl]-
EINECS	Contact for details

Quality Control

Our Bis(T-Butylcyclopentadienyl)Hafnium Dichloride is manufactured under stringent conditions to ensure high purity and batch-to-batch consistency, meeting the exacting standards required for semiconductor and catalysis applications. Each lot is analyzed using advanced techniques including NMR, elemental analysis, and chromatography. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) at a controlled room temperature (15-25°C) in a cool, dry, and well-ventilated place. This material is both hygroscopic (moisture-sensitive) and easily oxidized; exposure to air and moisture must be minimized to preserve product integrity.

Specification

Item	Specification
Appearance	Off-white to pale yellow crystalline solid
Identification (NMR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Hafnium (Hf) Content	35.0 - 37.0 %
Chloride (Cl) Content	13.5 - 14.5 %

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.