Description

(4-Methoxy-3,5-Dimethylphenyl)Dimethylsulfonium 4,4,5,5,6,6-Hexafluoro-1,3,2-Dithiazinan-2-Ide 1,1,3,3-Tetraoxide is a highly specialized organosulfur salt, recognized as a powerful and selective photoacid generator (PAG) for advanced photoresist formulations. This compound is critical for enabling the high-resolution patterning required in the production of next-generation semiconductors and microelectronic devices. It is primarily utilized by electronic chemicals manufacturers and semiconductor R&D teams working on deep ultraviolet (DUV) and other cutting-edge lithography technologies.

Application

• Advanced Photoresist Formulation: A key component in chemically amplified resists (CARs) for semiconductor lithography.
• Deep Ultraviolet (DUV) Lithography: Enables high-resolution patterning for integrated circuits with sub-micron feature sizes.
• Microelectronics Manufacturing: Used in the fabrication of memory chips, microprocessors, and other semiconductor components.
• Photoacid Generator (PAG) Research: Serves as a critical reagent in the development and testing of new photoresist chemistries.
• Specialty Polymer Synthesis: Can act as an initiator or catalyst in controlled polymerization reactions for high-performance materials.
• Optical Material Production: Potential use in creating photosensitive coatings and films for optical applications.

Basic Information

Product Name	(4-Methoxy-3,5-Dimethylphenyl)Dimethylsulfonium 4,4,5,5,6,6-Hexafluoro-1,3,2-Dithiazinan-2-Ide 1,1,3,3-Tetraoxide
CAS No.	2222384-17-8
Molecular Formula	C13H19F6NO5S3
Molecular Weight	487.48 g/mol
Synonyms	Dimethyl(4-methoxy-3,5-dimethylphenyl)sulfonium 4,4,5,5,6,6-hexafluoro-1,3,2-dithiazinane-2-ide 1,1,3,3-tetraoxide; (4-Methoxy-3,5-dimethylphenyl)dimethylsulfonium hexafluorodithiazinate tetraoxide; Sulfonium salt PAG; Photoacid Generator 2222384-17-8; DUV PAG; Aryl sulfonium salt; Hexafluoro-1,3,2-dithiazinane-2-ide tetraoxide salt
EINECS	Contact for details

Quality Control

Every batch of our photoacid generator is manufactured and tested under strict quality management systems to ensure the high purity and batch-to-batch consistency demanded by the semiconductor industry. We provide comprehensive Certificates of Analysis (COA) detailing purity, identity, and impurity profiles, supported by analytical techniques including HPLC, NMR, and IR spectroscopy. Our quality commitment aligns with the standards required for electronic grade chemicals.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This compound is hygroscopic (moisture-sensitive) and must be handled under an inert atmosphere (e.g., nitrogen or argon) when opening the container to prevent degradation. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to reference spectrum
Identification (NMR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.