Description

6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonic Acid is a specialized diazonaphthoquinone derivative, a key photochemical intermediate in advanced manufacturing processes. Its primary value lies in its ability to act as a highly effective photoactive compound (PAC) and acid generator upon exposure to specific wavelengths of light. This compound is essential for industries requiring high-precision photolithography and photo-patterning technologies. Its unique structure makes it a critical component for producing high-resolution imaging materials.

Application

• Photoresist Formulations: A crucial photoactive compound (PAC) in the production of positive photoresists for semiconductor and microelectronics fabrication.
• Printing Plate Manufacturing: Used in the photosensitive layers of offset printing plates (e.g., PS plates) for high-fidelity image reproduction.
• Advanced Lithography: Serves as a chemical amplifier in deep-ultraviolet (DUV) and other advanced lithography processes for integrated circuits.
• Photoinitiator Systems: Functions as an acid generator in UV-curable coatings, inks, and adhesives.
• Chemical Synthesis: An intermediate for synthesizing more complex dyes, pigments, and functional organic molecules.
• Research & Development: Utilized in academic and industrial R&D for developing novel photoresponsive materials and studying photochemical reactions.

Basic Information

Product Name	6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonic Acid
CAS No.	20546-03-6
Molecular Formula	C₁₀H₆N₂O₄S
Molecular Weight	250.23 g/mol
Synonyms	1,2-Naphthoquinonediazide-5-sulfonic Acid; 1,2-Naphthoquinone-2-diazide-5-sulfonic Acid; 2-Diazo-1-naphthol-5-sulfonic Acid; DNQ Sulfonic Acid; NQD-5; Photosensitive Compound 20546-03-6; 5-Sulfo-1,2-naphthoquinone-2-diazide; 1,2-Naphthoquinone-2-diazido-5-sulfonic Acid
EINECS	Contact for details

Quality Control

Our production of 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonic Acid adheres to stringent quality management protocols to ensure batch-to-batch consistency and high purity, which is critical for photoresist performance. Each lot is analyzed using advanced techniques like HPLC and NMR to confirm identity and assay purity. Certificates of Analysis (COA) documenting all critical parameters are provided with every shipment. We support customer audits and can tailor specifications to meet specific application requirements.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at a controlled room temperature (15-25°C). Due to its hygroscopic (moisture-sensitive) nature, the container must be kept sealed under dry, inert conditions to prevent decomposition. Keep away from heat, sparks, and open flame. Separate from incompatible materials such as strong bases and reducing agents.

Specification

Item	Specification
Appearance	Yellow to light brown crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Water Content (KF)	≤ 1.0%
Residue on Ignition	≤ 0.5%
Heavy Metals (as Pb)	≤ 20 ppm
Solubility (Test)	Soluble in alkaline aqueous solutions and polar aprotic solvents

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.