Description

4-Benzoyl-2,3-Dihydroxyphenyl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate is a specialized diazonaphthoquinone (DNQ) derivative, a critical class of compounds in advanced photoresist formulations. Its value lies in its role as a photoactive compound (PAC) that enables high-resolution patterning essential for modern microelectronics manufacturing. This chemical is primarily required by manufacturers in the semiconductor and printed circuit board (PCB) industries for producing photomasks and photoresist layers.

Application

• Semiconductor Photoresists: A key photoactive component in positive-tone photoresist formulations for deep-UV (DUV) and i-line lithography processes.
• Printed Circuit Board (PCB) Fabrication: Used in photoresist inks and films for creating precise circuit patterns on PCB substrates.
• Photomask Production: Essential for manufacturing high-precision photomasks used in photolithography.
• Micro-Electro-Mechanical Systems (MEMS): Enables the patterning of intricate micro-scale mechanical structures.
• Advanced Packaging: Supports lithography steps in fan-out wafer-level packaging (FOWLP) and other advanced IC packaging technologies.
• Optical Component Fabrication: Used in the production of diffraction gratings and other micro-optical elements.
• Research & Development: Serves as a precursor or standard in R&D for developing next-generation photoresist chemistries and lithographic techniques.

Basic Information

Product Name	4-Benzoyl-2,3-Dihydroxyphenyl 6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate
CAS No.	2481-86-9
Molecular Formula	C23H14N2O7S
Molecular Weight	462.43 g/mol
Synonyms	2-Diazo-1-naphthol-5-sulfonic acid ester with 2,3,4-trihydroxybenzophenone; DNQ Sulfonate Ester; Photoactive Compound (PAC) 2481-86-9; 2,3,4-Trihydroxybenzophenone-1,2-naphthoquinonediazide-5-sulfonate; 1,2-Naphthoquinone-2-diazide-5-sulfonyl chloride ester with 2,3,4-trihydroxybenzophenone; Benzophenone derivative of diazonaphthoquinone sulfonate; Light Sensitizer 2481-86-9; Photoresist sensitizer
EINECS	Contact for details

Quality Control

Our production of this high-purity photochemical adheres to strict quality protocols to ensure batch-to-batch consistency critical for lithographic performance. Quality is verified through comprehensive analytical methods including HPLC for purity and assay, spectroscopic identification, and control of key impurities. A Certificate of Analysis (COA) detailing lot-specific results is provided with each shipment to support your quality management system.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). Due to its light-sensitive and easily oxidized nature, it is recommended to store the material under an inert atmosphere (e.g., nitrogen or argon) for long-term stability. Keep away from heat and incompatible materials.

Specification

Item	Specification
Appearance	Yellow to orange crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Solubility Test	Clear solution in specified solvents

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.