Description

Sulfonium, (4-Methylphenyl)Diphenyl-, Salt With 2-[(2,2-Difluoro-2-Sulfoacetyl)Oxy]Ethyl Tricyclo[3.3.1.13,7]Decane-1-Carboxylate is a specialized, high-performance photoacid generator (PAG) salt designed for advanced lithographic processes. This compound is critical for enabling high-resolution patterning in the production of next-generation semiconductors and microelectronics. It is primarily utilized by manufacturers of photoresists and photopolymers for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography, where precise control over acid generation is paramount.

Application

• Advanced Semiconductor Lithography: As a key component in chemically amplified photoresists for DUV (248nm, 193nm) and EUV (13.5nm) lithography processes.
• Microelectronics Fabrication: Enables the creation of ultra-fine circuit patterns for integrated circuits (ICs), memory chips, and processors.
• Photopolymer Formulation: Used in high-performance, radiation-sensitive polymers for advanced coatings and imaging applications.
• Photo-Curing Systems: Acts as an efficient cationic photoinitiator for UV-curable inks, coatings, and adhesives requiring specific performance characteristics.
• Research & Development: Serves as a critical reagent in academic and industrial R&D for developing new photoresist materials and lithographic techniques.
• Optical Component Manufacturing: Applied in the patterning of waveguides, micro-optics, and other precision optical elements.

Basic Information

Product Name	Sulfonium, (4-Methylphenyl)Diphenyl-, Salt With 2-[(2,2-Difluoro-2-Sulfoacetyl)Oxy]Ethyl Tricyclo[3.3.1.13,7]Decane-1-Carboxylate
CAS No.	1135815-31-4
Molecular Formula	Contact for details
Molecular Weight	Contact for details
Synonyms	(4-Methylphenyl)diphenylsulfonium 2-[(2,2-Difluoro-2-sulfoacetyl)oxy]ethyl 1-adamantanecarboxylate; Diphenyl(4-methylphenyl)sulfonium 1-Adamantanyloxycarbonyl-2,2-difluoroethanesulfonate; (p-Tolyl)diphenylsulfonium 1-Adamantyloxycarbonyl-2,2-difluoroethanesulfonate; Sulfonium, (4-methylphenyl)diphenyl-, 2-[(2,2-difluoro-2-sulfoacetyl)oxy]ethyl tricyclo[3.3.1.13,7]decane-1-carboxylate; PAG; Photoacid Generator Salt; EUV PAG; Sulfonium Salt PAG.
EINECS	Contact for details

Quality Control

Our production of this high-purity photoacid generator adheres to strict quality management systems to ensure batch-to-batch consistency critical for lithographic performance. Each lot undergoes comprehensive analytical testing, including HPLC for purity and impurity profiling, NMR for structural confirmation, and ICP-MS for trace metal analysis. A detailed Certificate of Analysis (COA) is provided with every shipment, documenting key parameters such as assay, moisture content, and specific performance indicators relevant to semiconductor-grade materials.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is strictly light-sensitive and hygroscopic; it must be stored under an inert atmosphere (e.g., nitrogen or argon) in a desiccated environment to prevent decomposition and moisture absorption. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Related Substances (HPLC)	Total impurities ≤ 2.0%
Residual Solvents (GC)	Meets ICH guidelines
Trace Metals (ICP-MS)	≤ 10 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.