Description

Triphenylsulphonium Hexafluoroantimonate(1-) is a highly effective and widely used photoacid generator (PAG) in advanced chemical processes. This compound matters for its exceptional efficiency in generating strong acids upon exposure to light, which is critical for initiating precise polymerization and cross-linking reactions. It is primarily needed by manufacturers in the electronics industry for photoresist formulations in semiconductor fabrication, as well as by producers of specialty coatings, inks, and advanced polymeric materials.

Application

• Photoresist Formulations: A key component in chemical amplification resists (CARs) for deep-UV, EUV, and electron-beam lithography in semiconductor manufacturing.
• UV-Curable Coatings & Inks: Serves as a cationic photoinitiator for the rapid, low-energy curing of epoxy-based coatings, inks, and adhesives.
• Polymer Synthesis & Modification: Used as an initiator for cationic polymerization of epoxides, vinyl ethers, and other monomers.
• Fiber Optics: Employed in the production of UV-curable coatings for optical fibers.
• Advanced Composites: Facilitates the curing of matrix resins in fiber-reinforced composites for aerospace and automotive applications.
• 3D Printing (Stereolithography): Acts as a photoinitiator in vat polymerization processes for high-resolution 3D printing.
• Microelectronics Packaging: Used in the fabrication of protective coatings and insulating layers.

Basic Information

Product Name	Triphenylsulphonium Hexafluoroantimonate(1-)
CAS No.	57840-38-7
Molecular Formula	C18H15F6SSb
Molecular Weight	507.12 g/mol
Synonyms	Triphenylsulfonium Hexafluoroantimonate; Triphenylsulfonium Antimonate(1-), Hexafluoro-; TPS-HFA; Photoacid Generator PAG 1; Triphenylsulfonium Hexafluoroantimonate(V); (SP-4-1)-Hexafluoroantimonate(1-) Triphenylsulfonium; Triphenylsulfonium SbF6; Triphenylsulfonium Hexafluoroantimonate Salt
EINECS	Contact for details

Quality Control

Our Triphenylsulphonium Hexafluoroantimonate(1-) undergoes rigorous quality testing to ensure compliance with industry standards for high-purity photoacid generators. Each batch is analyzed to confirm critical parameters such as purity, ionic content, and photo-activity. Certificates of Analysis (COA) detailing lot-specific results from HPLC, NMR, and ICP-MS are available upon request to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). This product is hygroscopic (moisture-sensitive) and light-sensitive; containers must be kept tightly sealed and away from moisture and direct light exposure to maintain stability and performance.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Heavy Metals (as Pb)	≤ 20 ppm
Chloride (Cl)	≤ 50 ppm
Sulfate (SO4)	≤ 100 ppm
Loss on Drying	≤ 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.