Description

2-Methyl-Acrylic Acid 6-(2-Methyl-Acryloyloxy)-Naphthalen-2-Yl Ester is a specialized, high-purity methacrylate monomer featuring a naphthalene-based core structure. This compound is valued for its ability to impart unique optical, thermal, and mechanical properties when incorporated into advanced polymeric materials. It is primarily sought by R&D and production teams in the photoresist, optical film, and specialty coating industries, where performance under demanding conditions is critical. Our supply ensures consistent quality and reliable availability for your formulation and synthesis needs.

Application

• Advanced Photoresists: A key monomer for formulating high-resolution photoresists used in semiconductor and display manufacturing (e.g., LCD, OLED).
• Optical Polymers & Films: Used in the synthesis of polymers for optical waveguides, lenses, and light-diffusing films requiring specific refractive indices.
• Specialty Coatings & Adhesives: Imparts enhanced durability, adhesion, and chemical resistance in high-performance industrial and electronic coatings.
• Lithography & Microfabrication: Serves as a reactive component in chemical amplification resists for deep-UV and other advanced lithography techniques.
• Functional Monomer for R&D: Used in academic and industrial research to develop novel polymers with tailored properties for electronics and optics.

Basic Information

Product Name	2-Methyl-Acrylic Acid 6-(2-Methyl-Acryloyloxy)-Naphthalen-2-Yl Ester
CAS No.	151705-85-0
Molecular Formula	C18H16O4
Molecular Weight	296.32 g/mol
Synonyms	6-(Methacryloyloxy)-2-naphthyl methacrylate; 2-Naphthol, 6-(methacryloyloxy)-, methacrylate; 2-Methacrylic Acid 6-Methacryloyloxynaphthalen-2-yl Ester; 6-Hydroxy-2-naphthyl methacrylate methacrylate; Dinaphthyl methacrylate derivative; Photoresist monomer NA; MA-NMA Ester
EINECS	Contact for details

Quality Control

Every batch of our 2-Methyl-Acrylic Acid 6-(2-Methyl-Acryloyloxy)-Naphthalen-2-Yl Ester is produced and tested under a strict quality management system. We guarantee high purity and lot-to-lot consistency critical for sensitive applications like photoresists and optical materials. Comprehensive analytical testing, including HPLC and GC, is performed. A Certificate of Analysis (COA) detailing purity, identity, and impurity profiles is provided with each shipment to ensure it meets your technical specifications.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C/59-77°F). This product is light-sensitive and easily oxidized; for long-term storage, consider maintaining under an inert atmosphere (e.g., nitrogen or argon) to preserve stability and prevent polymerization or degradation. Keep away from heat, sparks, and open flame.

Specification

Item	Specification
Appearance	White to off-white crystalline powder or solid
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Related Substances (HPLC)	Total impurities ≤ 2.0%
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.