Description

Tri-p-Tolylsulfonium Hexafluorophosphate is a high-purity photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. Its primary value lies in its ability to generate strong acids upon exposure to specific wavelengths of light, initiating precise chemical amplification reactions. This compound is essential for manufacturers in the semiconductor, electronics, and advanced printing industries requiring high-resolution patterning for microchips, printed circuit boards, and optical components.

Application

• Photoresist Formulations: A key photoacid generator (PAG) in chemically amplified resists (CARs) for deep-UV (DUV), KrF, and ArF lithography in semiconductor manufacturing.
• Electronics Fabrication: Used in the production of printed circuit boards (PCBs), flat panel displays, and other microelectronic devices requiring precise etching.
• Advanced Printing: Employed in high-resolution imaging systems, including laser direct imaging (LDI) for printing plates.
• Polymer & Material Science: Acts as a cationic initiator for the polymerization of epoxides and other monomers in UV-curable coatings, adhesives, and inks.
• Research & Development: Serves as a reagent in academic and industrial R&D for developing new photopolymerizable materials and lithographic processes.

Basic Information

Product Name	Tri-p-Tolylsulfonium Hexafluorophosphate
CAS No.	146062-15-9
Molecular Formula	C21H21F6PS
Molecular Weight	450.42 g/mol
Synonyms	Tris(4-methylphenyl)sulfonium Hexafluorophosphate; Tri(4-tolyl)sulfonium Hexafluorophosphate; p-Tolylsulfonium Hexafluorophosphate; Photoacid Generator PAG; Sulfonium Salt PAG; TPS-HFP; CAS 146062-15-9
EINECS	Contact for details

Quality Control

Our Tri-p-Tolylsulfonium Hexafluorophosphate is manufactured under strict quality management systems to ensure batch-to-batch consistency and high performance in sensitive applications. We provide comprehensive Certificates of Analysis (COA) with each shipment, detailing purity, identity, and impurity profiles. Our quality protocols are designed to meet the stringent requirements of the electronics and photochemical industries.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at room temperature (15-25°C). This product is hygroscopic (moisture-sensitive) and must be kept under dry, inert conditions to prevent decomposition. Keep away from incompatible materials such as strong bases.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Heavy Metals	≤ 10 ppm
Chloride (Cl)	≤ 50 ppm
Sulfate (SO4)	≤ 50 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.