Description

Tris(4-tert-Butylphenyl)Sulfonium is a specialized organosulfur compound, specifically a sulfonium salt, known for its role as a highly efficient photoacid generator (PAG). This compound matters for its ability to generate strong acids upon exposure to specific wavelengths of light, initiating critical polymerization and cross-linking reactions. It is primarily needed by manufacturers in the electronics and advanced materials sectors for producing high-resolution photoresists essential for semiconductor fabrication and UV-curable coatings.

Application

• Semiconductor Photoresists: A key photoacid generator (PAG) in chemically amplified resists (CARs) for deep-UV (DUV) and extreme-UV (EUV) lithography processes.
• UV-Curable Coatings & Inks: Initiates rapid cationic polymerization for durable, scratch-resistant surface finishes and printing inks.
• Advanced Polymer Synthesis: Serves as a catalyst or initiator in the production of specialized polymers and epoxy resins.
• Optical Fiber Production: Used in coatings and cladding materials that require precise, light-triggered curing.
• Microelectronics Packaging: Facilitates patterning and insulation in advanced packaging technologies like fan-out wafer-level packaging (FOWLP).
• Photopolymer Printing Plates: Enables high-fidelity image formation in flexographic and letterpress printing plates.

Basic Information

Product Name	Tris(4-tert-Butylphenyl)Sulfonium
CAS No.	134708-14-8
Molecular Formula	C30H39S+ (Counterion dependent)
Molecular Weight	Contact for details
Synonyms	Tris(4-tert-butylphenyl)sulfonium Salt; Tris(p-tert-butylphenyl)sulfonium; Photoacid Generator PAG; Sulfonium, tris(4-(1,1-dimethylethyl)phenyl)-; Tris(4-tert-butylphenyl)sulfonium Cation; (4-tert-Butylphenyl)diphenylsulfonium related compound; Sulfonium-based PAG; Lithography Photoinitiator
EINECS	Contact for details

Quality Control

Our Tris(4-tert-Butylphenyl)Sulfonium is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity, critical for sensitive photolithography applications. Each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing purity, identity, and performance-related specifications. We adhere to industry best practices and can support compliance requirements for electronics-grade materials.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and light-sensitive; containers must be kept sealed under an inert atmosphere (e.g., nitrogen or argon) after opening to prevent degradation and moisture absorption.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Chloride Content	Contact for details

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.