Description

Dibenzylphenylsulfonium Hexafluoroantimonate is a high-purity photoacid generator (PAG) salt, a critical component in advanced photoresist formulations for high-resolution lithography. Its primary value lies in generating strong acid species upon exposure to deep ultraviolet (DUV) or electron beam (e-beam) radiation, enabling precise pattern development in microelectronics manufacturing. This compound is essential for R&D and production facilities in the semiconductor, advanced packaging, and photopolymer industries seeking reliable, high-performance cationic initiators.

Application

• Semiconductor Photolithography: A key photoacid generator in chemically amplified resists (CARs) for DUV (248nm, 193nm) and e-beam lithography processes.
• Advanced Packaging: Used in the fabrication of redistribution layers (RDLs), through-silicon vias (TSVs), and other fine-feature patterns.
• Photopolymerization: Acts as an efficient cationic initiator for UV-curable coatings, inks, and adhesives, particularly for epoxy-based systems.
• Microfabrication & MEMS: Enables high-aspect-ratio patterning for micro-electromechanical systems and micro-optical components.
• Printed Circuit Board (PCB) Manufacturing: Employed in high-density interconnect (HDI) and solder mask imaging requiring superior resolution.
• Academic & Industrial R&D: Serves as a research chemical for developing next-generation photoresists and studying cationic polymerization mechanisms.

Basic Information

Product Name	Dibenzylphenylsulfonium Hexafluoroantimonate
CAS No.	134164-24-2
Molecular Formula	C26H23F6SSb
Molecular Weight	609.28 g/mol
Synonyms	Dibenzyl(phenyl)sulfonium Hexafluoroantimonate(V); Phenylbis(phenylmethyl)sulfonium Hexafluoroantimonate(1-); Photoacid Generator PAG; Sulfonium Salt Photoinitiator; Antimonate(1-), hexafluoro-, phenylbis(phenylmethyl)sulfonium; DBPSH; Dibenzylphenylsulfonium SbF6
EINECS	Contact for details

Quality Control

Every batch of Dibenzylphenylsulfonium Hexafluoroantimonate is manufactured and tested under strict quality management systems to ensure consistency and performance for critical lithographic applications. We provide comprehensive Certificates of Analysis (COA) detailing purity, identity, and impurity profiles. Our quality commitment aligns with the stringent requirements of the semiconductor and electronics industries.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and must be kept under an inert atmosphere (e.g., nitrogen or argon) in its original packaging to prevent decomposition. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Heavy Metals (as Pb)	< 10 ppm
Chloride (Cl)	< 50 ppm
Sulfate (SO4)	< 50 ppm
Loss on Drying	< 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.