Description

Sulfonium, (4-Hydroxyphenyl)Methyl(1-Naphthalenylmethyl)-, (Oc-6-11)-Hexafluoroantimonate(1-) (1:1) is a specialized sulfonium salt photoacid generator (PAG) used in advanced photoresist formulations. This compound matters for its role in enabling high-resolution patterning in semiconductor and microelectronics manufacturing. It is primarily needed by R&D chemists and production engineers in the photolithography, advanced packaging, and printed circuit board (PCB) industries for next-generation chip fabrication.

Application

• Chemical Amplification Photoresists (CARs): Acts as a critical photoacid generator (PAG) component in deep ultraviolet (DUV) and extreme ultraviolet (EUV) photoresists for semiconductor lithography.
• Advanced Semiconductor Fabrication: Enables the production of sub-10nm node integrated circuits (ICs) by generating acid upon exposure to light, catalyzing the resist's solubility switch.
• Microelectronics & Advanced Packaging: Used in the patterning of redistribution layers (RDLs), through-silicon vias (TSVs), and other fine features in 2.5D/3D packaging technologies.
• Printed Circuit Board (PCB) Manufacturing: Employed in high-density interconnect (HDI) PCB production for creating precise micro-vias and circuit patterns.
• Optical Materials & Coatings: Serves as an acid catalyst precursor in photo-curable polymers and coatings for optical lenses and waveguides.
• Academic & Industrial R&D: A key reagent for developing novel photopolymerization systems and studying cationic polymerization mechanisms.

Basic Information

Product Name	Sulfonium, (4-Hydroxyphenyl)Methyl(1-Naphthalenylmethyl)-, (Oc-6-11)-Hexafluoroantimonate(1-) (1:1)
CAS No.	133152-67-7
Molecular Formula	C24H21F6OSSb
Molecular Weight	603.25 g/mol
Synonyms	(4-Hydroxyphenyl)methyl(1-naphthalenylmethyl)sulfonium hexafluoroantimonate; (4-Hydroxyphenyl)methyl(1-naphthylmethyl)sulfonium hexafluoroantimonate; 1-Naphthalenemethanaminium, N-[(4-hydroxyphenyl)methyl]-N-methyl-, hexafluoroantimonate(1-); Sulfonium, (4-hydroxyphenyl)methyl(1-naphthalenylmethyl)-, hexafluoroantimonate(1-); Photoacid Generator PAG; Sulfonium Salt PAG; Triphenylsulfonium hexafluoroantimonate derivative; Aryl sulfonium salt.
EINECS	Contact for details

Quality Control

Our production of this high-purity photoacid generator adheres to strict quality protocols to ensure batch-to-batch consistency critical for photolithography performance. Each lot undergoes comprehensive analysis, including HPLC for purity and NMR for structural confirmation. A detailed Certificate of Analysis (COA) is provided with every shipment, documenting key parameters such as assay, moisture content (KF), and metallic impurities to meet the exacting standards of the semiconductor industry.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and light-sensitive; therefore, containers must be kept tightly sealed under an inert atmosphere (e.g., nitrogen or argon) after opening to prevent degradation. Store away from incompatible materials such as strong bases and oxidizing agents.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to reference spectrum
Identification (NMR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Specific Metals (ICP-MS)	Na, K, Ca, Fe, each ≤ 5 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.