Description

Triphenylsulfonium Chloride solution is a high-purity, photoacid generator (PAG) salt, a critical component in advanced chemical amplification systems. Its primary value lies in its exceptional efficiency and stability, enabling precise control in photochemical reactions. This product is essential for manufacturers in the electronics and specialty polymer industries, particularly for producing high-resolution photoresists for semiconductor fabrication and as a catalyst in cationic polymerization processes.

Application

• Semiconductor Photolithography: A key photoacid generator (PAG) in chemically amplified photoresists for deep-UV (DUV) and extreme-UV (EUV) lithography processes.
• Advanced Polymer Synthesis: Initiator and catalyst for cationic polymerization of epoxides, vinyl ethers, and other monomers to produce specialty coatings and adhesives.
• Microelectronics Packaging: Used in the formulation of dielectric materials, solder masks, and insulating layers for printed circuit boards (PCBs).
• Optical Materials: Component in the production of photo-patternable optical waveguides, lenses, and other micro-optical elements.
• Research & Development: A versatile reagent in academic and industrial R&D for studying reaction mechanisms and developing new photo-sensitive materials.
• Specialty Coatings: Enables the creation of high-performance, cross-linked coatings with enhanced chemical and thermal resistance.

Basic Information

Product Name	Triphenylsulfonium Chloride Solution
CAS No.	109037-76-5
Molecular Formula	C18H15ClS
Molecular Weight	298.83 g/mol
Synonyms	Triphenylsulfonium Chloride; Sulfonium, triphenyl-, chloride (1:1); TPS-C1; TPS-Cl; Photoacid Generator PAG; Triphenylsulfonium Chloride Salt; (Phenylsulfonio)triphenyl chloride; Chlorotriphenylsulfonium
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium Chloride solution is manufactured under strict quality management systems. Each batch undergoes rigorous analytical testing, including HPLC for purity and assay, NMR and IR for structural confirmation, and ICP-MS for trace metal analysis, to ensure it meets the stringent requirements of the electronics industry. A comprehensive Certificate of Analysis (COA) detailing purity, solvent content, and impurity profiles is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (typically 15-25°C). The product is sensitive to strong acids and should be kept away from incompatible materials. Keep the container tightly sealed when not in use to prevent solvent evaporation or moisture absorption.

Specification

Item	Specification
Appearance	Clear, colorless to pale yellow solution
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0% (on anhydrous basis)
Purity (HPLC)	≥ 99.0%
Solvent Content (GC)	Specified ± 2%
Water Content (KF)	≤ 0.5%
Chloride Content (Titration)	Conforms to theoretical
Trace Metals (ICP-MS)	< 10 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.