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2,2'-Bis-(1-Adamantyl)-4,4'-Dimethoxybiphenyl CAS NO 932033-57-3
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CAS No.:932033-57-3
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
2,2'-Bis-(1-Adamantyl)-4,4'-Dimethoxybiphenyl is a high-purity, sterically hindered biphenyl derivative, valued for its role as a sophisticated photoacid generator (PAG) precursor and advanced organic intermediate. This compound is critical for ensuring the performance and resolution of next-generation photoresist formulations used in semiconductor manufacturing. It is primarily required by R&D chemists and production specialists in the electronics, advanced materials, and fine chemical synthesis sectors.
Application
- Advanced Photoresist Formulations: A key precursor for photoacid generators (PAGs) used in deep-ultraviolet (DUV) and extreme-ultraviolet (EUV) lithography for semiconductor fabrication.
- Polymer Science & Material Development: Serves as a monomer or additive for creating polymers with tailored thermal stability and optical properties.
- Organic Synthesis & Catalysis: Utilized as a bulky ligand or building block in the synthesis of complex organic molecules and catalysts.
- Electronic Chemicals: A critical component in the production of high-performance electronic materials and coatings.
- Research & Development: Used in academic and industrial labs for developing new photochemical processes and functional materials.
Basic Information
| Product Name | 2,2'-Bis-(1-Adamantyl)-4,4'-Dimethoxybiphenyl |
| CAS No. | 932033-57-3 |
| Molecular Formula | C34H42O2 |
| Molecular Weight | 482.70 g/mol |
| Synonyms | 2,2'-Di(1-adamantyl)-4,4'-dimethoxy-1,1'-biphenyl; 2,2'-Bis(adamantan-1-yl)-4,4'-dimethoxybiphenyl; 4,4'-Dimethoxy-2,2'-di-1-adamantylbiphenyl; BADB; Bis(1-adamantyl)-4,4'-dimethoxybiphenyl; 1,1'-Biphenyl, 2,2'-bis(1-adamantyl)-4,4'-dimethoxy-; Photoacid Generator Precursor; PAG Intermediate |
| EINECS | Contact for details |
Quality Control
Our production of 2,2'-Bis-(1-Adamantyl)-4,4'-Dimethoxybiphenyl adheres to stringent quality protocols to ensure batch-to-batch consistency and high purity essential for sensitive applications like semiconductor lithography. Each lot is analyzed using advanced techniques including HPLC, NMR, and GC-MS. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles is provided with every shipment.
Storage
Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). Keep away from heat sources and incompatible materials. The container must be kept tightly sealed to prevent contamination.
Specification
| Item | Specification |
|---|---|
| Appearance | White to off-white crystalline powder |
| Identification (IR) | Conforms to reference spectrum |
| Assay (HPLC) | ≥ 98.0% |
| Melting Point | Contact for details |
| Loss on Drying | ≤ 0.5% |
| Residue on Ignition | ≤ 0.1% |
| Heavy Metals (as Pb) | ≤ 10 ppm |
| Related Substances (HPLC) | Individual impurity ≤ 0.5%; Total impurities ≤ 2.0% |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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