Description

5-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate) is a specialized diazonaphthoquinone sulfonate derivative, a key functional component in advanced photoresist formulations. Its primary value lies in its role as a photoactive compound (PAC), which is critical for generating high-resolution patterns in microelectronics manufacturing. This compound is essential for producers of photoresists targeting the semiconductor, printed circuit board (PCB), and advanced packaging industries, where precise control over light sensitivity and dissolution properties is paramount.

Application

• Photoresist Formulations: Serves as a core photoactive compound (PAC) in positive-tone photoresists for semiconductor lithography.
• Microelectronics Fabrication: Used in the production of integrated circuits (ICs), microchips, and other semiconductor devices requiring sub-micron feature patterning.
• Printed Circuit Board (PCB) Manufacturing: A key ingredient in photoresist inks and films for creating precise conductive pathways on PCBs.
• Advanced Packaging: Enables fine-pitch patterning in technologies like fan-out wafer-level packaging (FOWLP) and 2.5D/3D integration.
• Optical Component Fabrication: Potential use in creating micro-optical elements and diffraction gratings where high-resolution photo-patterning is required.
• Research & Development: Utilized in academic and industrial R&D for developing next-generation photoresist materials with enhanced performance.

Basic Information

Product Name	5-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate)
CAS No.	94202-19-4
Molecular Formula	C26H14N4O10S2
Molecular Weight	606.54 g/mol
Synonyms	1,3-Bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzene; 5-Hydroxy-1,3-phenylene bis(6-diazo-5-oxo-5,6-dihydronaphthalene-1-sulfonate); DNQ Sulfonate Ester; Photoactive Compound (PAC); Diazonaphthoquinone Sulfonate Ester; 1,3-Di(6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonyl)benzene; 94202-19-4; Light Sensitive Resin Intermediate
EINECS	Contact for details

Quality Control

Our production of 5-Hydroxy-1,3-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate) adheres to stringent quality protocols to ensure batch-to-batch consistency and performance reliability for critical photolithography applications. Each lot undergoes comprehensive analysis, including purity assay, spectral identification, and control of key impurities that can affect photospeed and resolution. Certificates of Analysis (COA) detailing all specifications are provided to support your quality management systems.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This product is hygroscopic (moisture-sensitive) and light-sensitive; therefore, containers must be kept sealed under an inert atmosphere (e.g., nitrogen or argon) when not in use to prevent degradation and moisture absorption. Keep away from heat and incompatible materials.

Specification

Item	Specification
Appearance	Yellow to orange powder or crystalline solid
Identification (IR)	Conforms to reference spectrum
Purity (HPLC)	≥ 98.0%
Moisture Content (KF)	≤ 1.0%
Residue on Ignition	≤ 0.5%
Heavy Metals (as Pb)	≤ 20 ppm
Specific Impurities (HPLC)	Individual ≤ 0.5%, Total ≤ 1.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.