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Formaldehyde, Polymer With 2-Methylphenol, 3-Methylphenol And 4-Methylphenol, 6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonate CAS NO 68511-23-9


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CAS No.:68511-23-9

Grade:Pharmacy Grade

Content:99.9%

Brand:Customizable

Packaging:Customizable

Description

Formaldehyde, Polymer With 2-Methylphenol, 3-Methylphenol And 4-Methylphenol, 6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonate CAS NO 68511-23-9 is a specialized, photosensitive polymeric compound engineered for advanced material science applications. This product matters as a high-performance precursor for generating light-sensitive coatings and functional polymers with tailored properties. It is primarily needed by manufacturers in the electronics industry for photoresist formulations and by R&D laboratories developing novel photoactive materials and specialty chemical intermediates.

Application

  • Photoresist Formulations: A key component in the production of light-sensitive resists for semiconductor manufacturing and printed circuit board (PCB) fabrication.
  • Advanced Coatings: Used in the development of specialty photo-curable and photo-patternable coatings for optical and electronic devices.
  • Chemical Synthesis: Serves as a polymeric intermediate or a photoactive cross-linking agent in the synthesis of novel polymers and resins.
  • Research & Development: Employed in academic and industrial R&D for exploring new photo-responsive materials and lithographic processes.
  • Specialty Adhesives: Potential use in formulating light-curable adhesives for precision assembly in microelectronics and optics.

Basic Information

Product Name Formaldehyde, Polymer With 2-Methylphenol, 3-Methylphenol And 4-Methylphenol, 6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonate
CAS No. 68511-23-9
Molecular Formula Contact for details
Molecular Weight Contact for details
Synonyms Poly(oxy(methyl-2,3,4-methylphenylene)) 6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonate; Cresol-Formaldehyde Polymer Diazonaphthoquinone Sulfonate; DNQ-Novolak Resin; Photoactive Compound (PAC); Novolac Diazonaphthoquinone; Positive Photoresist Resin; Light-Sensitive Novolak; Diazonaphthoquinone Sulfonate of Cresol-Formaldehyde Resin
EINECS Contact for details

Quality Control

Our production of this advanced material adheres to rigorous quality control protocols to ensure batch-to-batch consistency and performance reliability. Quality is verified through analytical methods including spectroscopy and chromatography to confirm chemical identity and purity. A Certificate of Analysis (COA) detailing specific lot parameters is provided with every shipment to support your quality assurance and regulatory needs.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). Due to its strictly light-sensitive nature, all handling and transfer operations should be conducted under subdued light or amber lighting conditions to prevent premature decomposition.

Specification

Item Specification
Appearance Yellow to light brown powder or solid
Identification (IR) Conforms to structure
Assay (Active Component) Contact for details
Solubility Soluble in common organic solvents (e.g., PGMEA, Ethyl Lactate)
Photosensitivity Active to UV light (typical i-line, g-line, or broadband)
Moisture Content < 1.0%
Residual Solvents Meets ICH guidelines

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.

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