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Formaldehyde, Polymer With 2-Methylphenol, 3-Methylphenol And 4-Methylphenol, 6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonate CAS NO 68511-23-9
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CAS No.:68511-23-9
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
Formaldehyde, Polymer With 2-Methylphenol, 3-Methylphenol And 4-Methylphenol, 6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonate CAS NO 68511-23-9 is a specialized, photosensitive polymeric compound engineered for advanced material science applications. This product matters as a high-performance precursor for generating light-sensitive coatings and functional polymers with tailored properties. It is primarily needed by manufacturers in the electronics industry for photoresist formulations and by R&D laboratories developing novel photoactive materials and specialty chemical intermediates.
Application
- Photoresist Formulations: A key component in the production of light-sensitive resists for semiconductor manufacturing and printed circuit board (PCB) fabrication.
- Advanced Coatings: Used in the development of specialty photo-curable and photo-patternable coatings for optical and electronic devices.
- Chemical Synthesis: Serves as a polymeric intermediate or a photoactive cross-linking agent in the synthesis of novel polymers and resins.
- Research & Development: Employed in academic and industrial R&D for exploring new photo-responsive materials and lithographic processes.
- Specialty Adhesives: Potential use in formulating light-curable adhesives for precision assembly in microelectronics and optics.
Basic Information
| Product Name | Formaldehyde, Polymer With 2-Methylphenol, 3-Methylphenol And 4-Methylphenol, 6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthalenesulfonate |
| CAS No. | 68511-23-9 |
| Molecular Formula | Contact for details |
| Molecular Weight | Contact for details |
| Synonyms | Poly(oxy(methyl-2,3,4-methylphenylene)) 6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonate; Cresol-Formaldehyde Polymer Diazonaphthoquinone Sulfonate; DNQ-Novolak Resin; Photoactive Compound (PAC); Novolac Diazonaphthoquinone; Positive Photoresist Resin; Light-Sensitive Novolak; Diazonaphthoquinone Sulfonate of Cresol-Formaldehyde Resin |
| EINECS | Contact for details |
Quality Control
Our production of this advanced material adheres to rigorous quality control protocols to ensure batch-to-batch consistency and performance reliability. Quality is verified through analytical methods including spectroscopy and chromatography to confirm chemical identity and purity. A Certificate of Analysis (COA) detailing specific lot parameters is provided with every shipment to support your quality assurance and regulatory needs.
Storage
Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). Due to its strictly light-sensitive nature, all handling and transfer operations should be conducted under subdued light or amber lighting conditions to prevent premature decomposition.
Specification
| Item | Specification |
|---|---|
| Appearance | Yellow to light brown powder or solid |
| Identification (IR) | Conforms to structure |
| Assay (Active Component) | Contact for details |
| Solubility | Soluble in common organic solvents (e.g., PGMEA, Ethyl Lactate) |
| Photosensitivity | Active to UV light (typical i-line, g-line, or broadband) |
| Moisture Content | < 1.0% |
| Residual Solvents | Meets ICH guidelines |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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