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Ester Of 2-Diazo-1-Naphthol-5-Sulfone With Pyrogallol Acetone Resin CAS NO 54990-32-8
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CAS No.:54990-32-8
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
Ester Of 2-Diazo-1-Naphthol-5-Sulfone With Pyrogallol Acetone Resin is a specialized photosensitive chemical compound designed for high-resolution imaging applications. This product is critical for industries requiring precise photochemical patterning, offering excellent light sensitivity and thermal stability. It is primarily utilized by manufacturers in the electronics and advanced printing sectors for creating photoresists and other light-sensitive coatings.
Application
- Photoresist Formulation: A key component in the production of high-performance negative-tone photoresists for semiconductor and microelectronics manufacturing.
- Printing Plate Production: Used in the synthesis of light-sensitive polymers for high-fidelity lithographic and flexographic printing plates.
- UV-Curable Coatings: Serves as a photoinitiator or cross-linking agent in specialty coatings and inks that cure under ultraviolet light.
- Optical Data Storage: Employed in the research and development of materials for advanced optical media and holographic recording.
- Chemical Amplification Systems: Functions as a photoacid generator (PAG) precursor in deep-UV and chemically amplified resist systems for finer circuit patterning.
- Specialty Adhesives: Incorporated into formulations for light-curable adhesives used in precision optical assembly and electronics.
Basic Information
| Product Name | Ester Of 2-Diazo-1-Naphthol-5-Sulfone With Pyrogallol Acetone Resin |
| CAS No. | 54990-32-8 |
| Molecular Formula | Contact for details |
| Molecular Weight | Contact for details |
| Synonyms | 2-Diazo-1-naphthol-5-sulfonic acid ester with pyrogallol-acetone resin; Naphthoquinonediazide sulfonate of pyrogallol acetone resin; Photosensitive ester of DNQ with novolac-type resin; Photoactive compound (PAC) based on diazonaphthoquinone and phenolic resin; DSN resin; DNQ-sulfonate ester resin; Light-sensitive phenolic resin ester |
| EINECS | Contact for details |
Quality Control
Our Ester Of 2-Diazo-1-Naphthol-5-Sulfone With Pyrogallol Acetone Resin is manufactured under strict quality protocols to ensure batch-to-batch consistency and performance reliability for critical photochemical processes. Each lot is tested for key parameters including photosensitivity, purity, and functional group content. Certificates of Analysis (COA) documenting these results are available upon request to support your quality assurance and regulatory compliance needs.
Storage
Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). Keep away from heat sources and incompatible materials. Due to its light-sensitive nature, handling should be conducted under appropriate yellow or red safelight conditions to prevent premature degradation.
Specification
| Item | Specification |
|---|---|
| Appearance | Yellow to light brown powder or resinous solid |
| Identification (IR) | Conforms to structure |
| Assay (Active Ester Content) | Contact for details |
| Photosensitivity | Contact for details |
| Solubility | Soluble in common organic solvents (e.g., PGMEA, Ethyl Lactate) |
| Loss on Drying | < 2.0 % |
| Residual Solvents | Meets ICH guidelines |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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