Description

(1-Methylethylidene)Di-4,1-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate) is a specialized diazonaphthoquinone sulfonate derivative, a critical class of compounds in advanced material science. Its core value lies in its function as a highly effective photoactive compound (PAC), enabling precise control in photochemical processes. This chemical is essential for manufacturers in the electronics and photoresist industries, where it is used to formulate high-resolution, chemically amplified photoresists for semiconductor and printed circuit board (PCB) fabrication.

Application

• Photoresist Formulation: A key photoactive component in positive-tone and chemically amplified photoresists for semiconductor manufacturing and microelectronics.
• Advanced Lithography: Used in deep-ultraviolet (DUV) and other advanced lithography processes to create intricate circuit patterns on silicon wafers.
• Printed Circuit Board (PCB) Production: Integral to the photoresist systems used for imaging and etching fine-line circuits on PCB substrates.
• Photoacid Generator (PAG) Precursor: Upon exposure to light, it generates acid catalysts that drive the solubility switch in modern photoresist chemistry.
• Optical Material Development: Serves as a building block for research into novel photosensitive polymers and optical coatings.
• Microlithography: Enables the high-precision patterning required for MEMS (Micro-Electro-Mechanical Systems) and other microfabrication technologies.

Basic Information

Product Name	(1-Methylethylidene)Di-4,1-Phenylene Bis(6-Diazo-5,6-Dihydro-5-Oxonaphthalene-1-Sulphonate)
CAS No.	38595-90-3
Molecular Formula	C34H22N4O8S2
Molecular Weight	678.69 g/mol
Synonyms	Bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonate) of 4,4'-(1-methylethylidene)bisphenol; 4,4'-(1-Methylethylidene)bisphenol bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonate); Bisphenol A bis(6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonate); DNQ Sulfonate of Bisphenol A; Photoactive Compound (PAC) based on Bisphenol A; BPA-DNQ; Diazonaphthoquinone Sulfonate Ester; Lithographic Photoacid Generator Precursor.
EINECS	Contact for details

Quality Control

Our production of this high-purity photoactive compound adheres to strict quality protocols to ensure batch-to-batch consistency critical for lithographic performance. Every lot is characterized using advanced analytical techniques including HPLC, NMR, and FT-IR to confirm chemical identity, purity, and the absence of critical impurities. A comprehensive Certificate of Analysis (COA) detailing assay, impurity profile, and performance-related tests is provided with each shipment to support your quality assurance and regulatory needs.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is light-sensitive (store away from light) and should be handled in environments with minimal exposure to ambient light to prevent premature decomposition. Keep the container tightly sealed in a dry atmosphere to protect from moisture.

Specification

Item	Specification
Appearance	Yellow to orange powder or crystalline solid
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 1.0%
Heavy Metals	≤ 20 ppm
Residual Solvents (GC)	Meets ICH guidelines

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.