Description

(4-Phenylthiophenyl)Diphenylsulfonium Triflate is a high-purity photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. Its core value lies in generating a strong acid upon exposure to specific wavelengths of light, enabling precise patterning in microelectronics manufacturing. This compound is essential for R&D and production teams in the semiconductor, advanced packaging, and photopolymer industries seeking to develop next-generation lithographic processes.

Application

• Chemical Amplification Resists (CARs): A key photoacid generator for deep-UV (DUV), KrF, and ArF excimer laser lithography used in semiconductor fabrication.
• Advanced Photopolymer Systems: Catalyst for cationic polymerization in UV-curable coatings, inks, and adhesives requiring high resolution and sensitivity.
• Microelectronics R&D: Enables the development of novel resist chemistries for extreme ultraviolet (EUV) and electron-beam lithography.
• Photo-patterning of Functional Materials: Used in the fabrication of micro-optical elements, waveguides, and printed circuit boards (PCBs).
• Acid-catalyzed Imaging: Critical for high-performance imaging films and graphic arts materials.

Basic Information

Product Name	(4-Phenylthiophenyl)Diphenylsulfonium Triflate
CAS No.	111281-12-0
Molecular Formula	C25H19F3O3S3
Molecular Weight	528.60 g/mol
Synonyms	Diphenyl-(4-phenylthiophenyl)sulfonium Trifluoromethanesulfonate; (4-Phenylthiophenyl)diphenylsulfonium Trifluoromethanesulfonate; Sulfonium, diphenyl(4-phenylthiophenyl)-, trifluoromethanesulfonate; PAG-TF; Photoacid Generator Triflate; Triphenylsulfonium Triflate derivative; (p-Phenylthiophenyl)diphenylsulfonium Triflate
EINECS	Contact for details

Quality Control

Our (4-Phenylthiophenyl)Diphenylsulfonium Triflate is manufactured under strict quality management systems. Each batch undergoes comprehensive analytical testing, including HPLC for purity and identity confirmation via NMR and IR spectroscopy, to ensure it meets the stringent requirements of photoresist applications. A detailed Certificate of Analysis (COA) is provided with every shipment, confirming compliance with agreed specifications.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at 15-25°C. This material is strictly light-sensitive and hygroscopic; containers must be kept sealed under an inert atmosphere (e.g., nitrogen or argon) in a desiccator to prevent moisture absorption and decomposition. Keep away from strong acids and incompatible organic solvents.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Identification (NMR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.