Description

Diphenyl-2,4,6-Trimethylphenylsulfonium p-Toluenesulfonate is a high-purity photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. Its primary value lies in generating strong acids upon exposure to specific light sources, initiating the chemical reactions necessary for precise pattern development in microelectronics. This compound is essential for manufacturers and R&D facilities in the semiconductor, advanced packaging, and photopolymer industries requiring high-resolution lithography.

Application

• Semiconductor Photolithography: A key photoacid generator (PAG) in chemically amplified resists (CAR) for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes.
• Advanced Packaging: Used in the fabrication of redistribution layers (RDLs), through-silicon vias (TSVs), and other fine-feature patterns in 2.5D/3D IC packaging.
• Printed Circuit Board (PCB) Manufacturing: Employed in high-density interconnect (HDI) and solder mask photoresists for creating intricate circuit patterns.
• Optical Device Fabrication: Integral to the production of micro-optical elements, waveguides, and other photonic components via photopolymerization.
• Research & Development: Serves as a critical reagent in academic and industrial labs for developing next-generation photoresist materials and studying cationic polymerization mechanisms.
• Specialty Coatings & Inks: Used in UV-curable coatings, inks, and adhesives where precise, acid-catalyzed cross-linking is required.

Basic Information

Product Name	Diphenyl-2,4,6-Trimethylphenylsulfonium p-Toluenesulfonate
CAS No.	347841-51-4
Molecular Formula	C26H24O3S2
Molecular Weight	448.59 g/mol
Synonyms	Diphenyl(2,4,6-trimethylphenyl)sulfonium p-toluenesulfonate; (2,4,6-Trimethylphenyl)diphenylsulfonium tosylate; Sulfonium, diphenyl(2,4,6-trimethylphenyl)-, 4-methylbenzenesulfonate; Triphenylsulfonium tosylate derivative; Photoacid Generator PAG; Sulfonium salt PAG; DTS-203 (common industry code); Diphenylmesitylsulfonium tosylate
EINECS	Contact for details

Quality Control

Every batch of Diphenyl-2,4,6-Trimethylphenylsulfonium p-Toluenesulfonate is manufactured and tested under strict quality management systems to ensure consistency and performance critical for lithographic applications. Our products undergo rigorous quality testing, including advanced chromatographic and spectroscopic methods, to ensure compliance with industry standards. Certificates of Analysis (COA) detailing purity, impurity profiles, and performance characteristics are available upon request.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive); the container must be kept tightly sealed in a dry environment to prevent degradation. For long-term storage, consider using desiccants.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Heavy Metals (as Pb)	≤ 10 ppm
Related Substances (HPLC)	Total impurities ≤ 1.0%
Solubility	Soluble in common organic solvents (e.g., PGMEA, cyclohexanone)

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.