Description

Tetrakis(Diethylamino)Hafnium is a highly specialized organometallic compound, primarily utilized as a precursor in advanced thin-film deposition processes. Its core value lies in enabling the precise, high-purity deposition of hafnium-based films, which are critical for modern electronic and optical applications. This product is essential for manufacturers and R&D facilities in the semiconductor, photovoltaic, and specialty coating industries seeking to enhance device performance and miniaturization.

Application

• Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) of hafnium oxide (HfO₂) high-k dielectric films for advanced semiconductor gate stacks.
• Fabrication of optical coatings and waveguides requiring precise refractive index control.
• Production of corrosion-resistant and thermal barrier coatings for aerospace and industrial components.
• Research and development of next-generation memory devices (e.g., DRAM, FRAM).
• Deposition of thin films for photovoltaic cells and other energy-related applications.
• As a key precursor in the synthesis of other hafnium-containing complex materials.

Basic Information

Product Name	Tetrakis(Diethylamino)Hafnium
CAS No.	19824-55-6
Molecular Formula	C16H40HfN4
Molecular Weight	446.03 g/mol
Synonyms	Hafnium(IV) diethylamide; Hafnium tetra(diethylamide); TDEAH; Hf(NEt2)4; Hafnium(4+) tetrakis(N,N-diethylazanide); Tetrakis(diethylamido)hafnium(IV); Hafnium tetraks(dietilamid); Bis(diethylamino)hafnium (common misnomer)
EINECS	Contact for details

Quality Control

Our Tetrakis(Diethylamino)Hafnium is manufactured under stringent conditions to ensure the high purity and consistency required for sensitive deposition processes. Each batch undergoes rigorous analytical testing, including NMR, GC-MS, and elemental analysis, to verify identity, purity, and trace metal content. Certificates of Analysis (COA) detailing all specifications are available upon request, supporting your quality assurance and regulatory compliance needs.

Storage

Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) at room temperature (15-25°C) in a cool, dry, and well-ventilated area. This compound is highly volatile, hygroscopic (moisture-sensitive), and easily oxidized; exposure to air, moisture, or light must be minimized to maintain product integrity.

Specification

Item	Specification
Appearance	Clear, colorless to pale yellow liquid
Identification (NMR)	Conforms to structure
Purity (GC)	≥ 99.5%
Hafnium (Hf) Content	Contact for details
Trace Metals (ICP-MS)	< 10 ppm total
Density (at 20°C)	~1.2 g/mL

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.