Description

2-ethoxyethyl 4-[[(6-diazo-5,6-dihydro-5-oxo-1-naphthyl)sulphonyl]oxy]-γ-[4-[[(6-diazo-5,6-dihydro-5-oxo-1-naphthyl)sulphonyl]oxy]phenyl]-γ-methylbenzenebutyrate is a specialized, high-purity diazonaphthoquinone (DNQ) derivative, a critical class of compounds in advanced material science. Its primary value lies in its role as a photoactive compound (PAC) and photoacid generator (PAG), enabling precise chemical transformations upon exposure to specific light wavelengths. This compound is essential for manufacturers in the semiconductor and advanced photoresist industries, where it is used to create intricate micro-patterns on silicon wafers.

Application

• Photoresist Formulation: A key photoactive component in chemical amplification resists (CARs) for deep-ultraviolet (DUV), KrF, and ArF lithography in semiconductor manufacturing.
• Advanced Lithography: Enables the production of high-resolution, sub-micron patterns critical for integrated circuits (ICs) and microchips.
• Photoacid Generation: Upon irradiation, it generates acid catalysts that drive solubility-switch reactions in the polymer matrix, defining the lithographic pattern.
• Printed Circuit Board (PCB) Fabrication: Used in photoresists for creating fine-line circuitry on PCB substrates.
• Optical Material Production: Potential use in the synthesis of specialized optical films and light-sensitive coatings.
• Research & Development: Serves as a high-purity intermediate for developing next-generation photoresist materials and studying photochemical mechanisms.

Basic Information

Item	Details
Product Name	2-ethoxyethyl 4-[[(6-diazo-5,6-dihydro-5-oxo-1-naphthyl)sulphonyl]oxy]-γ-[4-[[(6-diazo-5,6-dihydro-5-oxo-1-naphthyl)sulphonyl]oxy]phenyl]-γ-methylbenzenebutyrate
CAS No.	74276-41-8
Molecular Formula	C43H36N4O12S2
Molecular Weight	865.90 g/mol
Synonyms	2-(2-Ethoxyethoxy)ethyl 4-[[(6-diazo-5,6-dihydro-5-oxo-1-naphthalenyl)sulfonyl]oxy]-γ-[4-[[(6-diazo-5,6-dihydro-5-oxo-1-naphthalenyl)sulfonyl]oxy]phenyl]-γ-methylbenzenebutanoate; DNQ Derivative; Diazonaphthoquinone Sulfonate Ester; Photoacid Generator (PAG); PAC; 2-Ethoxyethyl Ester of Bis-DNQ; Lithography Chemical; 74276-41-8
EINECS	Contact for details

Quality Control

Our production of this high-purity photoactive compound adheres to strict semiconductor-grade standards. Every batch undergoes comprehensive analytical testing, including HPLC for purity and isomer distribution, FT-IR and NMR for structural confirmation, and UV-Vis spectroscopy to verify photochemical activity. We provide full traceability and Certificates of Analysis (COA) detailing all critical parameters to ensure consistency and performance in your sensitive lithography processes.

Storage

Preserve in a tightly closed container, protected from light. Store in a freezer at -20°C or below under an inert atmosphere (e.g., nitrogen or argon) to prevent oxidation and thermal degradation. Allow the container to reach room temperature in a dark environment before opening to minimize condensation and light exposure. Keep away from heat and ignition sources.

Specification

Item	Specification
Appearance	Yellow to light brown crystalline powder
Identification (IR)	Conforms to structure
Identification (HPLC)	Conforms to reference retention time
Purity (HPLC, Area %)	≥ 98.0%
Related Substances (HPLC)	Total impurities ≤ 2.0%
Water Content (KF)	≤ 0.5% w/w
Residue on Ignition	≤ 0.1%
Photochemical Activity (UV)	Conforms to reference spectrum

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.