Description

Triphenylsulfonium 1,1,2-Trifluoro-4-(Methacryloyloxy)Butane-1-Sulfonate is a high-purity, advanced photoacid generator (PAG) monomer designed for cutting-edge photoresist formulations. This compound matters because it provides exceptional lithographic performance, enabling the production of finer features in semiconductor manufacturing. It is primarily needed by manufacturers of advanced photoresists for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes.

Application

• Advanced Photoresist Formulations: A critical component in chemically amplified resists (CARs) for DUV (248nm, 193nm) and EUV lithography.
• Semiconductor Fabrication: Enables high-resolution patterning for integrated circuits (ICs), memory chips, and logic devices.
• Photopolymerization Initiator: Used in specialized UV-curable coatings, inks, and adhesives requiring precise acid-catalyzed cross-linking.
• Microelectronics Packaging: Facilitates the creation of fine-pitch interconnects and redistribution layers in advanced packaging technologies.
• Photolithographic Research & Development: Serves as a key material for developing next-generation lithography materials and processes.
• Specialty Polymer Synthesis: Acts as a functional monomer for creating polymers with specific acid-labile or ionic properties.

Basic Information

Product Name	Triphenylsulfonium 1,1,2-Trifluoro-4-(Methacryloyloxy)Butane-1-Sulfonate
CAS No.	960012-02-6
Molecular Formula	C30H27F3O5S2
Molecular Weight	612.66 g/mol
Synonyms	Triphenylsulfonium 1,1,2-Trifluoro-4-(methacryloyloxy)butane-1-sulfonate; (1,1,2-Trifluoro-4-(methacryloyloxy)butane-1-sulfonic acid) triphenylsulfonium salt; Triphenylsulfonium 4-(Methacryloyloxy)-1,1,2-trifluorobutane-1-sulfonate; Methacryloyloxy PAG Monomer; Photoacid Generator Monomer; Sulfonium Salt PAG; EUV PAG Monomer; TPS-TFMS MA
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium 1,1,2-Trifluoro-4-(Methacryloyloxy)Butane-1-Sulfonate is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity required for semiconductor applications. Each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing purity, identity, and critical impurity profiles. We adhere to industry best practices and can provide material tailored to meet specific customer specifications.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at 15-25°C. Due to its hygroscopic (moisture-sensitive) nature, the container must be kept tightly sealed under an inert atmosphere (e.g., nitrogen or argon) after opening to prevent moisture absorption and decomposition. Keep away from heat and incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Heavy Metals (as Pb)	≤ 10 ppm
Residual Solvents (GC)	Meets ICH guidelines
Related Substances (HPLC)	Total impurities ≤ 2.0%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.