Description

Triphenylsulfonium 2,3,5,6-Tetrafluoro-4-(Methacryloyloxy)Benzenesulfonate is a specialized photoacid generator (PAG) monomer designed for advanced photoresist formulations. This compound is critical for enabling high-resolution patterning in semiconductor manufacturing and other photolithographic processes. It is primarily needed by manufacturers of photoresists, electronic chemicals, and advanced polymers for microelectronics and optoelectronics applications.

Application

• Chemically Amplified Photoresists (CARs): A key component in deep ultraviolet (DUV), extreme ultraviolet (EUV), and electron beam (e-beam) photoresists for semiconductor fabrication.
• Advanced Lithography: Enables the production of sub-10nm feature sizes in integrated circuits (ICs) and microchips.
• Polymer Synthesis: Serves as a functional monomer for creating polymers with photoacid-generating side chains for specialty coatings.
• Optical Materials: Used in the development of photosensitive materials for waveguides, optical switches, and other photonic devices.
• Surface Modification: Facilitates photo-patterning and surface functionalization of materials for microfluidic and MEMS devices.
• Research & Development: A vital reagent for academic and industrial R&D in materials science, polymer chemistry, and nanotechnology.

Basic Information

Product Name	Triphenylsulfonium 2,3,5,6-Tetrafluoro-4-(Methacryloyloxy)Benzenesulfonate
CAS No.	915090-37-8
Molecular Formula	C28H20F4O5S2
Molecular Weight	584.58 g/mol
Synonyms	Triphenylsulfonium 2,3,5,6-Tetrafluoro-4-(methacryloyloxy)benzenesulfonate; 4-(Methacryloyloxy)-2,3,5,6-tetrafluorobenzenesulfonic Acid Triphenylsulfonium Salt; TPS-TFMS Methacrylate; Photoacid Generator Monomer; PAG Monomer; Sulfonium Salt Photoinitiator; (2,3,5,6-Tetrafluoro-4-methacryloyloxyphenyl)sulfonyloxy-triphenylsulfonium
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium 2,3,5,6-Tetrafluoro-4-(Methacryloyloxy)Benzenesulfonate is manufactured under strict quality systems to ensure batch-to-batch consistency and high purity required for sensitive lithographic applications. Each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles. We adhere to industry best practices and can support compliance requirements for semiconductor-grade materials.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and should be handled under dry, inert conditions to prevent degradation. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Purity (HPLC, Area %)	≥ 99.0%
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Chloride (Cl)	≤ 50 ppm
Sulfate (SO4)	≤ 100 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.