Description

3-Methyl-3-(Toluenesulfonyloxymethyl)Oxetane is a specialized oxetane derivative functionalized with a tosylate leaving group, making it a valuable building block in advanced organic synthesis. This compound is particularly significant for its role in polymer chemistry and materials science, where it serves as a key monomer or cross-linking agent. It is primarily needed by R&D laboratories and industrial manufacturers in the pharmaceutical, agrochemical, and specialty polymer sectors for developing novel materials with tailored properties. Its reactive oxetane ring and activated sulfonate ester moiety enable precise chemical modifications under controlled conditions.

Application

• Pharmaceutical Intermediate: Used in the synthesis of active pharmaceutical ingredients (APIs) and prodrugs, leveraging the oxetane ring for metabolic stability or as a synthetic handle.
• Polymer & Resin Modification: Acts as a reactive monomer or cross-linker in the production of specialty polymers, coatings, and adhesives to enhance properties like toughness, thermal stability, or chemical resistance.
• Agrochemical Synthesis: Serves as a precursor for creating novel herbicides, fungicides, or plant growth regulators with improved efficacy and environmental profiles.
• Liquid Crystal & OLED Materials: Employed in the development of advanced electronic and optoelectronic materials due to its ability to introduce specific functional groups into molecular frameworks.
• Dendrimer & Hyperbranched Polymer Construction: Utilized as a branching unit or core molecule in the controlled synthesis of complex, well-defined macromolecular architectures.
• Surface Functionalization Agent: Applied to modify the surface properties of nanoparticles, silica, or other substrates to impart specific chemical functionalities.
• Cross-linking Agent for Biopolymers: Used in research for modifying natural polymers or hydrogels for biomedical applications such as drug delivery systems or tissue engineering scaffolds.
• Lithography & Photoresist Components: Investigated for use in advanced photoresist formulations in semiconductor manufacturing due to its radiation-sensitive properties.

Basic Information

Product Name	3-Methyl-3-(Toluenesulfonyloxymethyl)Oxetane
CAS No.	99314-44-0
Molecular Formula	C12H16O4S
Molecular Weight	256.32 g/mol
Synonyms	3-(Tosyloxymethyl)-3-methyloxetane; 3-Methyl-3-((p-toluenesulfonyloxy)methyl)oxetane; 3-Methyl-3-(p-toluenesulfonyloxymethyl)oxetane; Tosyloxymethyl methyl oxetane; Oxetane, 3-methyl-3-[(4-methylbenzenesulfonyl)oxy]methyl]-; 3-[(Tosyloxy)methyl]-3-methyloxetane; 3-Methyl-3-(tosyloxymethyl)oxetane; p-Toluenesulfonic acid 3-methyl-3-oxetanylmethyl ester
EINECS	Contact for details

Quality Control

Our 3-Methyl-3-(Toluenesulfonyloxymethyl)Oxetane is produced under strict quality management protocols. Each batch undergoes rigorous analytical testing, including chromatographic purity assays and structural confirmation, to ensure it meets the high standards required for research and industrial synthesis. Certificates of Analysis (COA) detailing specific batch results are available upon request. We are committed to providing consistent quality and support compliance with relevant research and development guidelines.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at a controlled room temperature (typically 15-25°C). Due to its hygroscopic (moisture-sensitive) nature, the container must be kept tightly sealed under an inert atmosphere (e.g., nitrogen or argon) after opening to prevent degradation by moisture. Keep away from heat, sparks, and open flame.

Specification

Item	Specification
Appearance	White to off-white crystalline powder or solid
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 97.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Heavy Metals	≤ 20 ppm
Residual Solvents (GC)	Complies with ICH guidelines

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.